Assignee
AIXTRON SE
DE64 patents
Top patents by PatentIndex Score
US10544519B2Jan 28, 2020
Method and apparatus for surface preparation prior to epitaxial deposition
AIXTRON SE8 citations81
US9159608B2Oct 13, 2015
Method for forming TiSiN thin film layer by using atomic layer deposition
AIXTRON SE16 citations79
US9721759B1Aug 1, 2017
System and method for distributing RF power to a plasma source
AIXTRON SE14 citations76
US10329668B2Jun 25, 2019
Device and method for exhaust gas treatment on CVD reactor
AIXTRON SE11 citations72
US9831466B2Nov 28, 2017
Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier
AIXTRON SE2 citations72
US11702740B2Jul 18, 2023
Closure element for closing a loading opening of an inner housing of a CVD reactor
AIXTRON SE4 citations68
US9970106B2May 15, 2018
CVD system having particle separator
AIXTRON SE7 citations68
US11479851B2Oct 25, 2022
Substrate holder arrangement with mask support
AIXTRON SE2 citations67
US9942946B2Apr 10, 2018
Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus
AIXTRON SE3 citations66
US10501847B2Dec 10, 2019
Apparatus and method for generating a vapor for a CVD or PVD device
AIXTRON SE2 citations65
US9822451B2Nov 21, 2017
Device and method for manufacturing nanostructures consisting of carbon
AIXTRON SE2 citations65
US11396697B2Jul 26, 2022
Device for separating a structured layer on a substrate, and method for setting up the device
AIXTRON SE2 citations64
US11746419B2Sep 5, 2023
Shield plate for a CVD reactor
AIXTRON SE2 citations63
US11168410B2Nov 9, 2021
Susceptor for a chemical vapour deposition reactor
AIXTRON SE2 citations63
US9988712B2Jun 5, 2018
Substrate holding device
AIXTRON SE6 citations63
US9443702B2Sep 13, 2016
Methods for plasma processing
AIXTRON SE2 citations61
US8349081B2Jan 8, 2013
Gas distributor with pre-chambers arranged in planes
AIXTRON SE2 citations61
US10526708B2Jan 7, 2020
Methods for forming thin protective and optical layers on substrates
AIXTRON SE1 citations60
US10438823B2Oct 8, 2019
Substrate treatment device
AIXTRON SE1 citations57
US12584222B2Mar 24, 2026
Methods for thermal treatment of substrates
AIXTRON SE0 citations56
US12577670B2Mar 17, 2026
CVD reactor having means for locally influencing the susceptor temperature
AIXTRON SE0 citations56
US11851762B2Dec 26, 2023
Coating device having coated transmitter coil
AIXTRON SE0 citations56
US11713505B2Aug 1, 2023
Device and method for controlling the ceiling temperature of a CVD reactor
AIXTRON SE1 citations56
US12084768B2Sep 10, 2024
Method for using shield plate in a CVD reactor
AIXTRON SE0 citations53
US10267768B2Apr 23, 2019
Device and method for determining the concentration of a vapor by means of an oscillating body sensor
AIXTRON SE1 citations53
US11441223B2Sep 13, 2022
Susceptor for a CVD reactor
AIXTRON SE1 citations52
US11187676B2Nov 30, 2021
Device and method for determining the concentration of a vapor
AIXTRON SE0 citations52
US11959190B2Apr 16, 2024
Device for connecting a susceptor to a drive shaft
AIXTRON SE0 citations51
US10260147B2Apr 16, 2019
Device for depositing nanotubes
AIXTRON SE1 citations51
US10221482B2Mar 5, 2019
Gas distributor for a CVD reactor
AIXTRON SE1 citations51
US12577674B2Mar 17, 2026
Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactor
AIXTRON SE0 citations50
US12359319B2Jul 15, 2025
Arrangement for measuring the surface temperature of a susceptor in a CVD reactor
AIXTRON SE0 citations47
US12098462B2Sep 24, 2024
Method for producing a component part of a CVD reactor
AIXTRON SE0 citations47
US12012654B2Jun 18, 2024
Device for coating a substrate with a carbon-containing coating
AIXTRON SE0 citations47
US11268934B2Mar 8, 2022
Device and method for determining the concentration of a vapor
AIXTRON SE0 citations47
US11669072B2Jun 6, 2023
Device and method for obtaining information about layers deposited in a CVD method
AIXTRON SE0 citations46
US11053586B2Jul 6, 2021
Coated flat component in a CVD reactor
AIXTRON SE0 citations46
US11286566B2Mar 29, 2022
Apparatus for deposition of a III-V semiconductor layer
AIXTRON SE0 citations45
US10323322B2Jun 18, 2019
Gas inlet element of a CVD reactor with weight-reduced gas outlet plate
AIXTRON SE0 citations45
US9793104B2Oct 17, 2017
Preparing a semiconductor surface for epitaxial deposition
AIXTRON SE0 citations45
US12305282B2May 20, 2025
Susceptor of a CVD reactor
AIXTRON SE0 citations44
US12084767B2Sep 10, 2024
Gas-inlet element for a CVD reactor
AIXTRON SE0 citations44
US10883171B2Jan 5, 2021
CVD reactor and method for cleaning a CVD reactor
AIXTRON SE0 citations44
US12435422B2Oct 7, 2025
Method for recording a state of a CVD reactor under production conditions
AIXTRON SE0 citations43
US11052486B2Jul 6, 2021
Method and apparatus for producing a structure seed layer using a laser beam
AIXTRON SE0 citations42
US10060022B2Aug 28, 2018
Device and method for generating a vapor for a CVD or PVD device from multiple liquid or solid source materials
AIXTRON SE0 citations42
US12110591B2Oct 8, 2024
Susceptor arrangement of a CVD reactor
AIXTRON SE0 citations41
US10096473B2Oct 9, 2018
Formation of a layer on a semiconductor substrate
AIXTRON SE0 citations37
US12139793B2Nov 12, 2024
CVD device component provided with an individual identifier, and method for communicating information
AIXTRON SE0 citations36
US10526705B2Jan 7, 2020
Methods for controlling the substrate temperature using a plurality of flushing gases
AIXTRON SE0 citations36
Showing the top 50 of 64 patents by PatentIndex Score.