Assignee
ANJI MICROELECTRONICS SHANGHAI
CN·3 granted patents·1 pending application·0 citations·filing 2006–2006
Top patents by PatentIndex Score
4 records- 0146US8038749B2Composition for removing photoresist layer and method for using itANJI MICROELECTRONICS SHANGHAI·Filed 2006·Granted Oct 18, 2011·0 cites·8 claims
- 0245US7776231B2Chemical mechanical polishing slurries, their applications and method of use thereofANJI MICROELECTRONICS SHANGHAI·Filed 2006·Granted Aug 17, 2010·0 cites·20 claims
- 0342US7947195B2Polishing slurryANJI MICROELECTRONICS SHANGHAI·Filed 2006·Granted May 24, 2011·0 cites·8 claims
- 0439US2009095320A1Composition for Removing Photresist Layer and Method for Using itANJI MICROELECTRONICS SHANGHAI·Filed 2006·Application pending·0 cites
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →