Assignee
ARCH SPEC CHEM INC
US·57 granted patents·11 pending applications·1,818 citations·filing 1998–2006
Top patents by PatentIndex Score
68 records- 0197US6083840ASlurry compositions and method for the chemical-mechanical polishing of copper and copper alloysARCH SPEC CHEM INC·Filed 1998·Granted Jul 4, 2000·299 cites·28 claims
- 0295US6929891B2Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2004·Granted Aug 16, 2005·62 cites·61 claims
- 0395US6468913B1Ready-to-use stable chemical-mechanical polishing slurriesARCH SPEC CHEM INC·Filed 2000·Granted Oct 22, 2002·63 cites·37 claims
- 0493US6855476B2Photoacid generators for use in photoresist compositionsARCH SPEC CHEM INC·Filed 2002·Granted Feb 15, 2005·58 cites·29 claims
- 0593US6447563B1Chemical mechanical polishing slurry system having an activator solutionARCH SPEC CHEM INC·Filed 1999·Granted Sep 10, 2002·127 cites·39 claims
- 0692US7056641B2Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2005·Granted Jun 6, 2006·19 cites·34 claims
- 0792US6372050B2Non-corrosive stripping and cleaning compositionARCH SPEC CHEM INC·Filed 2001·Granted Apr 16, 2002·50 cites·5 claims
- 0892US6191086B1Cleaning composition and method for removing residuesARCH SPEC CHEM INC·Filed 1999·Granted Feb 20, 2001·67 cites·6 claims
- 0989US6413923B2Non-corrosive cleaning composition for removing plasma etching residuesARCH SPEC CHEM INC·Filed 1999·Granted Jul 2, 2002·54 cites·17 claims
- 1088US6589439B2Composition for selective etching of oxides over metalsARCH SPEC CHEM INC·Filed 2001·Granted Jul 8, 2003·38 cites·6 claims
- 1188US6143467APhotosensitive polybenzoxazole precursor compositionsARCH SPEC CHEM INC·Filed 1999·Granted Nov 7, 2000·63 cites·26 claims
- 1287US7132205B2Positive photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2004·Granted Nov 7, 2006·26 cites·43 claims
- 1387US6214516B1Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2000·Granted Apr 10, 2001·29 cites·22 claims
- 1486US6610808B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2002·Granted Aug 26, 2003·28 cites·6 claims
- 1585US6916543B2Copolymer, photoresist compositions thereof and deep UV bilayer system thereofARCH SPEC CHEM INC·Filed 2003·Granted Jul 12, 2005·28 cites·68 claims
- 1685US6323287B1Hydroxy-amino thermally cured undercoat for 193 NM lithographyARCH SPEC CHEM INC·Filed 1999·Granted Nov 27, 2001·33 cites·13 claims
- 1785US6177225B1Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 1999·Granted Jan 23, 2001·55 cites·18 claims
- 1884US6165682ARadiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereofARCH SPEC CHEM INC·Filed 1999·Granted Dec 26, 2000·54 cites·24 claims
- 1983US7129311B2Additives to prevent degradation of alkyl-hydrogen siloxanesARCH SPEC CHEM INC·Filed 2003·Granted Oct 31, 2006·30 cites·22 claims
- 2083US6361712B1Composition for selective etching of oxides over metalsARCH SPEC CHEM INC·Filed 1999·Granted Mar 26, 2002·61 cites·12 claims
- 2183US6268323B1Non-corrosive stripping and cleaning compositionARCH SPEC CHEM INC·Filed 1998·Granted Jul 31, 2001·44 cites·5 claims
- 2282US6312870B1t-butyl cinnamate polymers and their use in photoresist compositionsARCH SPEC CHEM INC·Filed 2000·Granted Nov 6, 2001·29 cites·24 claims
- 2381US6783916B2Hydroxy-amino thermally cured undercoat of 193 nm lithographyARCH SPEC CHEM INC·Filed 2001·Granted Aug 31, 2004·14 cites·5 claims
- 2479US6939659B2Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2004·Granted Sep 6, 2005·16 cites·40 claims
- 2577US6604555B2Automatic refill system for ultra pure or contamination sensitive chemicalsARCH SPEC CHEM INC·Filed 2002·Granted Aug 12, 2003·32 cites·44 claims
- 2676US6103680ANon-corrosive cleaning composition and method for removing photoresist and/or plasma etching residuesARCH SPEC CHEM INC·Filed 1998·Granted Aug 15, 2000·44 cites·17 claims
- 2776US6072006APreparation of partially cross-linked polymers and their use in pattern formationARCH SPEC CHEM INC·Filed 1998·Granted Jun 6, 2000·29 cites·15 claims
- 2874US7101652B2Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2004·Granted Sep 5, 2006·13 cites·79 claims
- 2974US6514664B1Radiation sensitive compositions containing image quality and profile enhancement additivesARCH SPEC CHEM INC·Filed 2000·Granted Feb 4, 2003·18 cites·22 claims
- 3073US6924339B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2003·Granted Aug 2, 2005·12 cites·18 claims
- 3173US6127086APhotosensitive resin compositionsARCH SPEC CHEM INC·Filed 1999·Granted Oct 3, 2000·31 cites·22 claims
- 3271US6783917B2Silicon-containing acetal protected polymers and photoresists compositions thereofARCH SPEC CHEM INC·Filed 2002·Granted Aug 31, 2004·13 cites·41 claims
- 3371US6245155B1Method for removing photoresist and plasma etch residuesARCH SPEC CHEM INC·Filed 1998·Granted Jun 12, 2001·27 cites·17 claims
- 3471US6146793ARadiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systemsARCH SPEC CHEM INC·Filed 1999·Granted Nov 14, 2000·30 cites·18 claims
- 3569US7129011B2Photosensitive resin compositionsARCH SPEC CHEM INC·Filed 2004·Granted Oct 31, 2006·26 cites·52 claims
- 3669US6435224B2Automatic refill system for ultra pure or contamination sensitive chemicalsARCH SPEC CHEM INC·Filed 2001·Granted Aug 20, 2002·21 cites·19 claims
- 3767US6159653AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1998·Granted Dec 12, 2000·24 cites·15 claims
- 3864US6929897B2Photosensitive bilayer compositionARCH SPEC CHEM INC·Filed 2004·Granted Aug 16, 2005·7 cites·64 claims
- 3963US7335319B2Semiconductor stress buffer coating edge bead removal compositions and method for their useARCH SPEC CHEM INC·Filed 2003·Granted Feb 26, 2008·9 cites·1 claims
- 4063US7018776B2Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systemsARCH SPEC CHEM INC·Filed 2003·Granted Mar 28, 2006·7 cites·36 claims
- 4162US6054248AHydroxy-diisocyanate thermally cured undercoat for 193 nm lithographyARCH SPEC CHEM INC·Filed 1999·Granted Apr 25, 2000·21 cites·23 claims
- 4260US6511789B2Photosensitive polyimide precursor compositionsARCH SPEC CHEM INC·Filed 2001·Granted Jan 28, 2003·10 cites·5 claims
- 4360US6492092B1Hydroxy-epoxide thermally cured undercoat for 193 NM lithographyARCH SPEC CHEM INC·Filed 1999·Granted Dec 10, 2002·20 cites·33 claims
- 4459US7001874B2Non-corrosive cleaning composition for removing plasma etching residuesARCH SPEC CHEM INC·Filed 2002·Granted Feb 21, 2006·2 cites·11 claims
- 4558US6911297B2Photoresist compositionsARCH SPEC CHEM INC·Filed 2003·Granted Jun 28, 2005·7 cites·22 claims
- 4656US7011935B2Method for the removal of an imaging layer from a semiconductor substrate stackARCH SPEC CHEM INC·Filed 2003·Granted Mar 14, 2006·8 cites·68 claims
- 4756US6803434B2Process for producing anhydride-containing polymers for radiation sensitive compositionsARCH SPEC CHEM INC·Filed 2003·Granted Oct 12, 2004·3 cites·27 claims
- 4856US6309793B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 2000·Granted Oct 30, 2001·9 cites·20 claims
- 4955US6262181B1Preparation of partially cross-linked polymers and their use in pattern formationARCH SPEC CHEM INC·Filed 1999·Granted Jul 17, 2001·15 cites·16 claims
- 5052US6124405APolymers for photoresist compositionsARCH SPEC CHEM INC·Filed 1999·Granted Sep 26, 2000·9 cites·9 claims
Showing the top 50 of 68 patent records by PatentIndex Score.
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