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ASELTA NANOGRAPHICS
FR12 patents
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Method for determining the parameters of an IC manufacturing process model
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Free form fracturing method for electronic or optical lithography
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Method of applying vertex based corrections to a semiconductor design
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Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure
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Method for the correction of electron proximity effects
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Free form fracturing method for electronic or optical lithography
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Method for determining the parameters of an IC manufacturing process by a differential procedure
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US10157728B2Dec 18, 2018
Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes
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Free form fracturing method for electronic or optical lithography using resist threshold control
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Method of performing dose modulation, in particular for electron beam lithography
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Method of correcting electron proximity effects using Voigt type scattering functions
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US10197909B2Feb 5, 2019
Method of reducing shot count in direct writing by a particle or photon beam
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