Assignee

ASML HOLDING NV

NL472 patents

Top patents by PatentIndex Score

US6867844B2Mar 15, 2005

Immersion photolithography system and method using microchannel nozzles

ASML HOLDING NV407 citations99

US6809794B1Oct 26, 2004

Immersion photolithography system and method using inverted wafer-projection optics interface

ASML HOLDING NV278 citations99

US6611316B2Aug 26, 2003

Method and system for dual reticle image exposure

ASML HOLDING NV717 citations99

US7025498B2Apr 11, 2006

System and method of measuring thermal expansion

ASML HOLDING NV156 citations98

US7063920B2Jun 20, 2006

Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems

ASML HOLDING NV211 citations97

US7234514B2Jun 26, 2007

Methods and systems for compact, micro-channel laminar heat exchanging

ASML HOLDING NV44 citations96

US7031077B2Apr 18, 2006

Optical reduction method with elimination of reticle diffraction induced bias

ASML HOLDING NV37 citations96

US6980277B2Dec 27, 2005

Immersion photolithography system and method using inverted wafer-projection optics interface

ASML HOLDING NV49 citations96

US6770424B2Aug 3, 2004

Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms

ASML HOLDING NV54 citations96

US6680798B2Jan 20, 2004

Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography

ASML HOLDING NV39 citations94

US7363854B2Apr 29, 2008

System and method for patterning both sides of a substrate utilizing imprint lithography

ASML HOLDING NV37 citations93

US7209220B2Apr 24, 2007

System for using a two part cover for and a box for protecting a reticle

ASML HOLDING NV37 citations93

US6760167B2Jul 6, 2004

Apparatus, system, and method for precision positioning and alignment of a lens in an optical system

ASML HOLDING NV42 citations93

US6731374B1May 4, 2004

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

ASML HOLDING NV35 citations93

US7580559B2Aug 25, 2009

System and method for calibrating a spatial light modulator

ASML HOLDING NV34 citations92

US7506299B2Mar 17, 2009

Feature optimization using interference mapping lithography

ASML HOLDING NV46 citations92

US7411650B2Aug 12, 2008

Immersion photolithography system and method using microchannel nozzles

ASML HOLDING NV14 citations92

US7400382B2Jul 15, 2008

Light patterning device using tilting mirrors in a superpixel form

ASML HOLDING NV24 citations92

US7239446B2Jul 3, 2007

Optical reduction system with control of illumination polarization

ASML HOLDING NV39 citations92

US7133121B2Nov 7, 2006

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

ASML HOLDING NV13 citations92

US7090964B2Aug 15, 2006

Lithographic printing with polarized light

ASML HOLDING NV18 citations92

US7046338B2May 16, 2006

EUV condenser with non-imaging optics

ASML HOLDING NV18 citations92

US7017390B1Mar 28, 2006

Proximity sensor nozzle shroud with flow curtain

ASML HOLDING NV15 citations92

US6965436B2Nov 15, 2005

System and method for calibrating a spatial light modulator array using shearing interferometry

ASML HOLDING NV15 citations92

US6963434B1Nov 8, 2005

System and method for calculating aerial image of a spatial light modulator

ASML HOLDING NV20 citations92

US6922230B2Jul 26, 2005

DUV scanner linewidth control by mask error factor compensation

ASML HOLDING NV16 citations92

US6912043B2Jun 28, 2005

Removable reticle window and support frame using magnetic force

ASML HOLDING NV35 citations92

US6876440B1Apr 5, 2005

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

ASML HOLDING NV22 citations92

US6867846B2Mar 15, 2005

Tailored reflecting diffractor for EUV lithographic system aberration measurement

ASML HOLDING NV21 citations92

US6847461B1Jan 25, 2005

System and method for calibrating a spatial light modulator array using shearing interferometry

ASML HOLDING NV27 citations92

US6836380B2Dec 28, 2004

Optical reduction system with elimination of reticle diffraction induced bias

ASML HOLDING NV27 citations92

US6826451B2Nov 30, 2004

Lithography tool having a vacuum reticle library coupled to a vacuum chamber

ASML HOLDING NV67 citations92

US6822728B2Nov 23, 2004

Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system

ASML HOLDING NV15 citations92

US6809827B2Oct 26, 2004

Self referencing mark independent alignment sensor

ASML HOLDING NV19 citations92

US6784978B2Aug 31, 2004

Method, system, and apparatus for management of reaction loads in a lithography system

ASML HOLDING NV19 citations92

US6778258B2Aug 17, 2004

Wafer handling system for use in lithography patterning

ASML HOLDING NV35 citations92

US6770895B2Aug 3, 2004

Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

ASML HOLDING NV14 citations92

US6633050B1Oct 14, 2003

Virtual gauging system for use in lithographic processing

ASML HOLDING NV16 citations92

US7304719B2Dec 4, 2007

Patterned grid element polarizer

ASML HOLDING NV33 citations91

US7061591B2Jun 13, 2006

Maskless lithography systems and methods utilizing spatial light modulator arrays

ASML HOLDING NV24 citations91

US7053990B2May 30, 2006

System to increase throughput in a dual substrate stage double exposure lithography system

ASML HOLDING NV17 citations91

US7023526B2Apr 4, 2006

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation

ASML HOLDING NV22 citations91

US7006295B2Feb 28, 2006

Illumination system and method for efficiently illuminating a pattern generator

ASML HOLDING NV15 citations91

US6994444B2Feb 7, 2006

Method and apparatus for managing actinic intensity transients in a lithography mirror

ASML HOLDING NV21 citations91

US6906789B2Jun 14, 2005

Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion

ASML HOLDING NV24 citations91

US6844027B1Jan 18, 2005

Environment exchange control for material on a wafer surface

ASML HOLDING NV13 citations91

US6768930B2Jul 27, 2004

Method and apparatus for resolving conflicts in a substrate processing system

ASML HOLDING NV31 citations91

Showing the top 50 of 472 patents by PatentIndex Score.

ASML HOLDING NV

Top patents by PatentIndex Score

Immersion photolithography system and method using microchannel nozzles

Immersion photolithography system and method using inverted wafer-projection optics interface

Method and system for dual reticle image exposure

System and method of measuring thermal expansion

Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems

Methods and systems for compact, micro-channel laminar heat exchanging

Optical reduction method with elimination of reticle diffraction induced bias

Immersion photolithography system and method using inverted wafer-projection optics interface

Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms

Optical reduction system with control of illumination polarization

Lithographic printing with polarized light

System for using a two part cover for protecting a reticle

Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography

System and method for patterning both sides of a substrate utilizing imprint lithography

System for using a two part cover for and a box for protecting a reticle

Apparatus, system, and method for precision positioning and alignment of a lens in an optical system

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

System and method for calibrating a spatial light modulator

Feature optimization using interference mapping lithography

Immersion photolithography system and method using microchannel nozzles

Light patterning device using tilting mirrors in a superpixel form

Optical reduction system with control of illumination polarization

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Lithographic printing with polarized light

EUV condenser with non-imaging optics

Proximity sensor nozzle shroud with flow curtain

System and method for calibrating a spatial light modulator array using shearing interferometry

System and method for calculating aerial image of a spatial light modulator

DUV scanner linewidth control by mask error factor compensation

Removable reticle window and support frame using magnetic force

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Tailored reflecting diffractor for EUV lithographic system aberration measurement

System and method for calibrating a spatial light modulator array using shearing interferometry

Optical reduction system with elimination of reticle diffraction induced bias

Lithography tool having a vacuum reticle library coupled to a vacuum chamber

Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system

Self referencing mark independent alignment sensor

Method, system, and apparatus for management of reaction loads in a lithography system

Wafer handling system for use in lithography patterning

Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Virtual gauging system for use in lithographic processing

Patterned grid element polarizer

Maskless lithography systems and methods utilizing spatial light modulator arrays

System to increase throughput in a dual substrate stage double exposure lithography system

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation

Illumination system and method for efficiently illuminating a pattern generator

Method and apparatus for managing actinic intensity transients in a lithography mirror

Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion

Environment exchange control for material on a wafer surface

Method and apparatus for resolving conflicts in a substrate processing system