Assignee

ASML MASKTOOLS BV

NL82 patents

Top patents by PatentIndex Score

US6792591B2Sep 14, 2004

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

ASML MASKTOOLS BV160 citations99

US7175940B2Feb 13, 2007

Method of two dimensional feature model calibration and optimization

ASML MASKTOOLS BV365 citations98

US6881523B2Apr 19, 2005

Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features

ASML MASKTOOLS BV121 citations98

US6541167B2Apr 1, 2003

System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features

ASML MASKTOOLS BV65 citations96

US7247574B2Jul 24, 2007

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

ASML MASKTOOLS BV47 citations95

US7138212B2Nov 21, 2006

Method and apparatus for performing model-based layout conversion for use with dipole illumination

ASML MASKTOOLS BV39 citations95

US6851103B2Feb 1, 2005

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

ASML MASKTOOLS BV44 citations95

US6788400B2Sep 7, 2004

Method and apparatus for detecting aberrations in an optical system

ASML MASKTOOLS BV45 citations95

US6753954B2Jun 22, 2004

Method and apparatus for detecting aberrations in a projection lens utilized for projection optics

ASML MASKTOOLS BV59 citations95

US6738859B2May 18, 2004

Method and apparatus for fast aerial image simulation

ASML MASKTOOLS BV82 citations95

US6553562B2Apr 22, 2003

Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques

ASML MASKTOOLS BV258 citations95

US6312854B1Nov 6, 2001

Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masks

ASML MASKTOOLS BV44 citations94

US7681171B2Mar 16, 2010

Method, program product and apparatus for performing double exposure lithography

ASML MASKTOOLS BV14 citations92

US7620930B2Nov 17, 2009

Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

ASML MASKTOOLS BV20 citations92

US7594199B2Sep 22, 2009

Method of optical proximity correction design for contact hole mask

ASML MASKTOOLS BV22 citations92

US7550235B2Jun 23, 2009

Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

ASML MASKTOOLS BV25 citations92

US7493589B2Feb 17, 2009

Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process

ASML MASKTOOLS BV14 citations92

US7342646B2Mar 11, 2008

Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model

ASML MASKTOOLS BV27 citations92

US7242459B2Jul 10, 2007

Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model

ASML MASKTOOLS BV31 citations92

US7231629B2Jun 12, 2007

Feature optimization using enhanced interference mapping lithography

ASML MASKTOOLS BV27 citations92

US7116411B2Oct 3, 2006

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

ASML MASKTOOLS BV27 citations92

US6951701B2Oct 4, 2005

Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

ASML MASKTOOLS BV18 citations92

US6875545B2Apr 5, 2005

Method of removing assist features utilized to improve process latitude

ASML MASKTOOLS BV27 citations92

US6623895B2Sep 23, 2003

Hybrid phase-shift mask

ASML MASKTOOLS BV38 citations92

US8050898B2Nov 1, 2011

Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

ASML MASKTOOLS BV29 citations91

US7355673B2Apr 8, 2008

Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout

ASML MASKTOOLS BV25 citations91

US7292315B2Nov 6, 2007

Optimized polarization illumination

ASML MASKTOOLS BV17 citations91

US7246342B2Jul 17, 2007

Orientation dependent shielding for use with dipole illumination techniques

ASML MASKTOOLS BV33 citations91

US6915505B2Jul 5, 2005

Method and apparatus for performing rule-based gate shrink utilizing dipole illumination

ASML MASKTOOLS BV34 citations91

US6482555B2Nov 19, 2002

Method of patterning sub-0.25λ line features with high transmission, “attenuated” phase shift masks

ASML MASKTOOLS BV21 citations91

US7864301B2Jan 4, 2011

Source and mask optimization by changing intensity and shape of the illumination source

ASML MASKTOOLS BV19 citations90

US7824826B2Nov 2, 2010

Method and apparatus for performing dark field double dipole lithography (DDL)

ASML MASKTOOLS BV9 citations84

US7523438B2Apr 21, 2009

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

ASML MASKTOOLS BV15 citations84

US7434195B2Oct 7, 2008

Method for performing full-chip manufacturing reliability checking and correction

ASML MASKTOOLS BV13 citations84

US7376930B2May 20, 2008

Method, program product and apparatus for generating assist features utilizing an image field map

ASML MASKTOOLS BV13 citations84

US7355681B2Apr 8, 2008

Optical proximity correction using chamfers and rounding at corners

ASML MASKTOOLS BV10 citations84

US7354681B2Apr 8, 2008

Scattering bar OPC application method for sub-half wavelength lithography patterning

ASML MASKTOOLS BV11 citations84

US7124395B2Oct 17, 2006

Automatic optical proximity correction (OPC) rule generation

ASML MASKTOOLS BV18 citations84

US7100145B2Aug 29, 2006

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

ASML MASKTOOLS BV13 citations84

US7820341B2Oct 26, 2010

Method of two dimensional feature model calibration and optimization

ASML MASKTOOLS BV12 citations83

US7774736B2Aug 10, 2010

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

ASML MASKTOOLS BV8 citations83

US7666554B2Feb 23, 2010

Method and apparatus for performing model-based layout conversion for use with dipole illumination

ASML MASKTOOLS BV11 citations83

US7652758B2Jan 26, 2010

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

ASML MASKTOOLS BV11 citations83

US7514183B2Apr 7, 2009

Method for performing transmission tuning of a mask pattern to improve process latitude

ASML MASKTOOLS BV16 citations83

US7349066B2Mar 25, 2008

Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence

ASML MASKTOOLS BV9 citations83

US7865865B2Jan 4, 2011

Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process

ASML MASKTOOLS BV7 citations82

Showing the top 50 of 82 patents by PatentIndex Score.

ASML MASKTOOLS BV

Top patents by PatentIndex Score

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method of two dimensional feature model calibration and optimization

Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features

Optical proximity correction

Method of fine feature edge tuning with optically-halftoned mask

Optical proximity correction method utilizing serifs having variable dimensions

Method and apparatus for minimizing optical proximity effects

System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

Method and apparatus for detecting aberrations in an optical system

Method and apparatus for detecting aberrations in a projection lens utilized for projection optics

Method and apparatus for fast aerial image simulation

Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques

Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masks

Method, program product and apparatus for performing double exposure lithography

Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

Method of optical proximity correction design for contact hole mask

Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process

Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model

Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model

Feature optimization using enhanced interference mapping lithography

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

Method of removing assist features utilized to improve process latitude

Hybrid phase-shift mask

Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout

Optimized polarization illumination

Orientation dependent shielding for use with dipole illumination techniques

Method and apparatus for performing rule-based gate shrink utilizing dipole illumination

Method of patterning sub-0.25λ line features with high transmission, “attenuated” phase shift masks

Source and mask optimization by changing intensity and shape of the illumination source

Method and apparatus for performing dark field double dipole lithography (DDL)

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

Method for performing full-chip manufacturing reliability checking and correction

Method, program product and apparatus for generating assist features utilizing an image field map

Optical proximity correction using chamfers and rounding at corners

Scattering bar OPC application method for sub-half wavelength lithography patterning

Automatic optical proximity correction (OPC) rule generation

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method of two dimensional feature model calibration and optimization

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

Method for performing transmission tuning of a mask pattern to improve process latitude

Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence

Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process