Assignee
AZ ELECTRONIC MAT (LUXEMBOURG) S A R L
US·15 granted patents·3 pending applications·43 citations·filing 2013–2015
Top patents by PatentIndex Score
18 records- 0196US9574104B1Compositions and processes for self-assembly of block copolymersAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Granted Feb 21, 2017·19 cites·16 claims
- 0284US9499698B2Metal hardmask composition and processes for forming fine patterns on semiconductor substratesAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Granted Nov 22, 2016·5 cites·20 claims
- 0382US9817312B2Silicon-containing heat- or photo-curable compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 14, 2017·3 cites·20 claims
- 0475US9810988B2Composition for forming overlay film, and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Nov 7, 2017·1 cites·15 claims
- 0575US9676946B2Coating compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Jun 13, 2017·3 cites·16 claims
- 0675US9580567B2Positive-type photosensitive siloxane compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Feb 28, 2017·2 cites·15 claims
- 0774US9411232B2Composition for forming fine resist pattern, and pattern formation method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 9, 2016·3 cites·16 claims
- 0872US9793109B2Perhydropolysilazane, composition containing same, and method for forming silica film using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Oct 17, 2017·3 cites·12 claims
- 0970US9505945B2Silicon containing block copolymers for direct self-assembly applicationAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 29, 2016·1 cites·21 claims
- 1068US9409793B2Spin coatable metallic hard mask compositions and processes thereofAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 9, 2016·2 cites·14 claims
- 1166US9482952B2Composition for forming topcoat layer and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 1, 2016·1 cites·10 claims
- 1250US9505721B2Aromatic imide compound and method for producing sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Nov 29, 2016·0 cites·15 claims
- 1349US2017176856A1Negative-working photoresist compositions for laser ablation and use thereofAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
- 1448US9418836B2Polyoxometalate and heteropolyoxometalate compositions and methods for their useAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 16, 2016·0 cites·5 claims
- 1546US9684240B2Negative-working photosensitive siloxane compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Jun 20, 2017·0 cites·16 claims
- 1637US9494867B2Rinsing liquid for lithography and pattern forming method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 15, 2016·0 cites·16 claims
- 1730US2017218227A1Sacrificial film composition, method for preparing same, semiconductor device having voids formed using said composition, and method for manufacturing semiconductor device using said compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
- 1825US2017173562A1Functionalized porous carbon, methods for making same, and methods for using same to remove contaminants from a fluidAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
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