Assignee

BAKLANOV MIKHAIL

BE·1 granted patent·1 citations·filing 2011–2011

Technology mixC23C1 H01L1 H10P1 H10W1

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0149US8974870B2Fabrication of porogen residues free low-k materials with improved mechanical and chemical resistanceBAKLANOV MIKHAIL·Filed 2011·Granted Mar 10, 2015·1 cites·16 claims

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