Assignee
BINNARD MICHAEL
US·7 granted patents·13 citations·filing 2007–2010
Top patents by PatentIndex Score
7 records- 0194US8488100B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2010·Granted Jul 16, 2013·6 cites·34 claims
- 0285US8514367B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Aug 20, 2013·3 cites·18 claims
- 0381US8269944B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Sep 18, 2012·2 cites·45 claims
- 0468US8582080B2Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stageBINNARD MICHAEL·Filed 2008·Granted Nov 12, 2013·2 cites·24 claims
- 0564US8879047B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2010·Granted Nov 4, 2014·0 cites·48 claims
- 0661US9081298B2Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Jul 14, 2015·0 cites·10 claims
- 0761US8848168B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Sep 30, 2014·0 cites·21 claims
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