Assignee
BRENNINGER GEORG
DE·3 granted patents·5 citations·filing 2009–2012
Top patents by PatentIndex Score
3 records- 0173US8283262B2Method for depositing a layer on a semiconductor wafer by means of CVD and chamber for carrying out the methodBRENNINGER GEORG·Filed 2009·Granted Oct 9, 2012·3 cites·4 claims
- 0264US10240235B2Method and apparatus for depositing a material layer originating from process gas on a substrate waferBRENNINGER GEORG·Filed 2012·Granted Mar 26, 2019·2 cites·16 claims
- 0351US9018021B2Method and apparatus for depositing a layer on a semiconductor wafer by vapor deposition in a process chamberBRENNINGER GEORG·Filed 2012·Granted Apr 28, 2015·0 cites·8 claims
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