Assignee

CABOT MIRCROELECTRONICS CORP

US·1 granted patent·12 citations·filing 2004–2004

Technology mixC09G1 C09K1 H10D1 H10P1

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0164US7563383B2CMP composition with a polymer additive for polishing noble metalsCABOT MIRCROELECTRONICS CORP·Filed 2004·Granted Jul 21, 2009·12 cites·18 claims

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