Assignee
CMC MAT INC
US13 patents
Top patents by PatentIndex Score
US11807710B2Nov 7, 2023
UV-curable resins used for chemical mechanical polishing pads
CMC MAT INC1 citations61
US11492514B2Nov 8, 2022
Derivatized polyamino acids
CMC MAT INC0 citations61
US12459076B2Nov 4, 2025
Chemical-mechanical polishing subpad having porogens with polymeric shells
CMC MAT INC0 citations59
US12398293B2Aug 26, 2025
Composition and method for polishing boron doped polysilicon
CMC MAT INC0 citations59
US11802220B2Oct 31, 2023
Silica-based slurry for selective polishing of carbon-based films
CMC MAT INC0 citations59
US12269969B2Apr 8, 2025
Polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxide
CMC MAT INC0 citations58
US12528973B2Jan 20, 2026
Composition and method for silicon oxide and carbon doped silicon oxide CMP
CMC MAT INC0 citations56
US11725116B2Aug 15, 2023
CMP composition including a novel abrasive
CMC MAT INC0 citations56
US12234382B2Feb 25, 2025
CMP composition including anionic and cationic inhibitors
CMC MAT INC0 citations54
US12428580B2Sep 30, 2025
CMP composition including an anionic abrasive
CMC MAT INC0 citations53
US12116502B2Oct 15, 2024
Self-stopping polishing composition and method for high topological selectivity
CMC MAT INC0 citations53
US11629271B2Apr 18, 2023
Titanium dioxide containing ruthenium chemical mechanical polishing slurry
CMC MAT INC0 citations52
US12472602B2Nov 18, 2025
Textured CMP pad comprising polymer particles
CMC MAT INC0 citations50