Assignee
Cymer LLC
US124 patents
Top patents by PatentIndex Score
US9989866B2Jun 5, 2018
Wafer-based light source parameter control
Cymer LLC18 citations91
US8809823B1Aug 19, 2014
System and method for controlling droplet timing and steering in an LPP EUV light source
Cymer LLC22 citations89
US9390827B2Jul 12, 2016
EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
Cymer LLC7 citations84
US9301382B2Mar 29, 2016
Apparatus for and method of source material delivery in a laser produced plasma EUV light source
Cymer LLC6 citations84
US8958143B2Feb 17, 2015
Master oscillator—power amplifier drive laser with pre-pulse for EUV light source
Cymer LLC8 citations84
US8872144B1Oct 28, 2014
System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
Cymer LLC18 citations84
US8847183B2Sep 30, 2014
System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
Cymer LLC6 citations84
US9207119B2Dec 8, 2015
Active spectral control during spectrum synthesis
Cymer LLC11 citations83
US8927952B2Jan 6, 2015
Target for laser produced plasma extreme ultraviolet light source
Cymer LLC6 citations83
US9835959B1Dec 5, 2017
Controlling for wafer stage vibration
Cymer LLC7 citations82
US9634455B1Apr 25, 2017
Gas optimization in a gas discharge light source
Cymer LLC9 citations82
US9261794B1Feb 16, 2016
Compensation for a disturbance in an optical source
Cymer LLC9 citations81
US9715180B2Jul 25, 2017
Wafer-based light source parameter control
Cymer LLC9 citations80
US9130337B1Sep 8, 2015
System and method for automatic gas optimization in a two-chamber gas discharge laser system
Cymer LLC16 citations80
US9119278B2Aug 25, 2015
System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output
Cymer LLC8 citations80
US9983060B1May 29, 2018
Calibration of a spectral analysis module
Cymer LLC12 citations78
US8901523B1Dec 2, 2014
Apparatus for protecting EUV optical elements
Cymer LLC13 citations77
US9541840B2Jan 10, 2017
Faceted EUV optical element
Cymer LLC4 citations73
USRE45957EMar 29, 2016
Regenerative ring resonator
Cymer LLC4 citations73
US9599510B2Mar 21, 2017
Estimation of spectral feature of pulsed light beam
Cymer LLC6 citations72
US9271381B2Feb 23, 2016
Methods and apparatus for laser produced plasma EUV light source
Cymer LLC6 citations72
US11526083B2Dec 13, 2022
Spectral feature selection and pulse timing control of a pulsed light beam
Cymer LLC2 citations71
US11054665B2Jul 6, 2021
Reducing speckle in an excimer light source
Cymer LLC3 citations71
US10451890B2Oct 22, 2019
Reducing speckle in an excimer light source
Cymer LLC3 citations71
US10416471B2Sep 17, 2019
Spectral feature control apparatus
Cymer LLC2 citations71
US10096969B1Oct 9, 2018
Method for dither free adaptive and robust dose control for photolithography
Cymer LLC2 citations71
US9997888B2Jun 12, 2018
Control of a spectral feature of a pulsed light beam
Cymer LLC5 citations71
US9939732B2Apr 10, 2018
Controller for an optical system
Cymer LLC2 citations71
US9819136B2Nov 14, 2017
Gas mixture control in a gas discharge light source
Cymer LLC5 citations71
US9762023B2Sep 12, 2017
Online calibration for repetition rate dependent performance variables
Cymer LLC3 citations71
US10288483B2May 14, 2019
Recovering spectral shape from spatial output
Cymer LLC2 citations69
US10288484B2May 14, 2019
Homogenization of light beam for spectral feature metrology
Cymer LLC2 citations69
US10416566B2Sep 17, 2019
Optimization of source and bandwidth for new and existing patterning devices
Cymer LLC3 citations68
US9966725B1May 8, 2018
Pulsed light beam spectral feature control
Cymer LLC4 citations67
US9778108B2Oct 3, 2017
Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beam
Cymer LLC3 citations66
US9360600B2Jun 7, 2016
System and method for correcting the focus of a laser beam
Cymer LLC4 citations66
US10345714B2Jul 9, 2019
Lithography optics adjustment and monitoring
Cymer LLC2 citations65
US10095118B2Oct 9, 2018
Lithography optics adjustment and monitoring
Cymer LLC4 citations64
US8829478B2Sep 9, 2014
Drive laser delivery systems for EUV light source
Cymer LLC3 citations63
US12244116B2Mar 4, 2025
Apparatus for and method of optical component alignment
Cymer LLC0 citations62
US11799261B2Oct 24, 2023
Apparatus for and method of optical component alignment
Cymer LLC0 citations62
US9735535B2Aug 15, 2017
Drive laser for EUV light source
Cymer LLC1 citations62
US8748854B2Jun 10, 2014
Laser produced plasma EUV light source
Cymer LLC3 citations62
US12253806B2Mar 18, 2025
Gas purge systems for a laser source
Cymer LLC0 citations61
US12124053B2Oct 22, 2024
Spectral feature control apparatus
Cymer LLC0 citations61
US11768438B2Sep 26, 2023
Spectral feature selection and pulse timing control of a pulsed light beam
Cymer LLC0 citations61
US11769982B2Sep 26, 2023
Lithography system bandwidth control
Cymer LLC0 citations61
US11686951B2Jun 27, 2023
Reducing speckle in an excimer light source
Cymer LLC0 citations61
US11561407B2Jan 24, 2023
Spectral feature control apparatus
Cymer LLC0 citations61
US10892594B2Jan 12, 2021
Gas optimization in a gas discharge light source
Cymer LLC0 citations61
Showing the top 50 of 124 patents by PatentIndex Score.