Assignee

DOERING HANS-JOACHIM

DE·1 granted patent·16 citations·filing 2009–2009

Technology mixB82Y1 G03F1 H01J1

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0183US8148702B2Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patternsDOERING HANS-JOACHIM·Filed 2009·Granted Apr 3, 2012·16 cites·22 claims

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