Assignee
DUONG ANH
US·7 granted patents·10 citations·filing 2010–2012
Top patents by PatentIndex Score
7 records- 0186US8518765B1Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residuesDUONG ANH·Filed 2012·Granted Aug 27, 2013·5 cites·18 claims
- 0278US8449681B2Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrateDUONG ANH·Filed 2010·Granted May 28, 2013·3 cites·14 claims
- 0364US8513117B2Process to remove Ni and Pt residues for NiPtSi applicationsDUONG ANH·Filed 2011·Granted Aug 20, 2013·2 cites·20 claims
- 0449US8466058B2Process to remove Ni and Pt residues for NiPtSi applications using chlorine gasDUONG ANH·Filed 2011·Granted Jun 18, 2013·0 cites·17 claims
- 0547US8784572B2Method for cleaning platinum residues on a semiconductor substrateDUONG ANH·Filed 2011·Granted Jul 22, 2014·0 cites·11 claims
- 0642US8894774B2Composition and method to remove excess material during manufacturing of semiconductor devicesDUONG ANH·Filed 2011·Granted Nov 25, 2014·0 cites·20 claims
- 0742US8697573B2Process to remove Ni and Pt residues for NiPtSi applications using aqua regia with microwave assisted heatingDUONG ANH·Filed 2011·Granted Apr 15, 2014·0 cites·11 claims
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