Assignee
ECHIGO MASATOSHI
JP10 patents
Top patents by PatentIndex Score
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Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern
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Radiation-sensitive composition
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Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
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Cyclic compound, method for producing same, composition, and method for forming resist pattern
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Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
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Radiation-sensitive composition
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Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
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Bicyclohexane derivative compound and manufacturing method of the same
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Compound for resist and radiation-sensitive composition specification
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Compound, radiation-sensitive composition and resist pattern formation method
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