Assignee
EHM DIRK HEINRICH
DE·7 granted patents·2 pending applications·21 citations·filing 2009–2013
Top patents by PatentIndex Score
9 records- 0183US9041905B2Optical arrangement, in particular in a projection exposure apparatus for EUV lithographyEHM DIRK HEINRICH·Filed 2012·Granted May 26, 2015·4 cites·28 claims
- 0279US8419862B2Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement thereforEHM DIRK HEINRICH·Filed 2010·Granted Apr 16, 2013·4 cites·8 claims
- 0378US8698999B2Protection module for EUV lithography apparatus, and EUV lithography apparatusEHM DIRK HEINRICH·Filed 2011·Granted Apr 15, 2014·3 cites·30 claims
- 0477US8279397B2Method for removing contamination on optical surfaces and optical arrangementEHM DIRK HEINRICH·Filed 2009·Granted Oct 2, 2012·5 cites·22 claims
- 0572US8477285B2Particle cleaning of optical elements for microlithographyEHM DIRK HEINRICH·Filed 2010·Granted Jul 2, 2013·3 cites·25 claims
- 0668US9354529B2Arrangement for use in a projection exposure tool for microlithography having a reflective optical elementEHM DIRK HEINRICH·Filed 2012·Granted May 31, 2016·1 cites·12 claims
- 0763US9249501B2Surface correction on coated mirrorsEHM DIRK HEINRICH·Filed 2012·Granted Feb 2, 2016·1 cites·16 claims
- 0841US2013176545A1Projection exposure apparatusEHM DIRK HEINRICH·Filed 2013·Application pending·0 cites
- 0938US2012250144A1Reflective optical element and method for operating an euv lithography apparatusEHM DIRK HEINRICH·Filed 2012·Application pending·0 cites
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