Assignee
ELIAN KLAUS
DE·11 granted patents·4 pending applications·128 citations·filing 2006–2012
Top patents by PatentIndex Score
15 records- 0197US9201123B2Magnetic sensor device and a method for fabricating the sameELIAN KLAUS·Filed 2011·Granted Dec 1, 2015·58 cites·15 claims
- 0296US9239386B2Sonic sensors and packagesELIAN KLAUS·Filed 2011·Granted Jan 19, 2016·13 cites·13 claims
- 0396US8759153B2Method for making a sensor device using a graphene layerELIAN KLAUS·Filed 2011·Granted Jun 24, 2014·23 cites·25 claims
- 0493US9728652B2Sensor device and methodELIAN KLAUS·Filed 2012·Granted Aug 8, 2017·14 cites·18 claims
- 0586US8513771B2Semiconductor package with integrated inductorELIAN KLAUS·Filed 2010·Granted Aug 20, 2013·8 cites·23 claims
- 0686US8124953B2Sensor device having a porous structure elementELIAN KLAUS·Filed 2009·Granted Feb 28, 2012·10 cites·17 claims
- 0761US9121885B2Sensor package and method of manufacturing thereofELIAN KLAUS·Filed 2010·Granted Sep 1, 2015·1 cites·24 claims
- 0860US8722462B2Semiconductor packageELIAN KLAUS·Filed 2010·Granted May 13, 2014·1 cites·26 claims
- 0953US9257724B2Reaction chamber arrangement and a method for forming a reaction chamber arrangementELIAN KLAUS·Filed 2011·Granted Feb 9, 2016·0 cites·26 claims
- 1051US2007105043A1Photosensitive coating for enhancing a contrast of a photolithographic exposureELIAN KLAUS·Filed 2006·Application pending·0 cites
- 1148US10107875B2GMR sensor within molded magnetic material employing non-magnetic spacerELIAN KLAUS·Filed 2009·Granted Oct 23, 2018·0 cites·15 claims
- 1246US9121880B2Magnetic sensor deviceELIAN KLAUS·Filed 2011·Granted Sep 1, 2015·0 cites·22 claims
- 1346US2009104558A1Solution for a Treatment of a Resist, a Modified Resist, a Process for the Treatment of a Resist and an Intermediate ProductELIAN KLAUS·Filed 2007·Application pending·0 cites
- 1444US2009273887A1Memory Device, Electronic Device, and Method for Producing a Memory DeviceELIAN KLAUS·Filed 2008·Application pending·0 cites
- 1542US2008003521A1Process and a device for creating a pattern in a photoresist layerELIAN KLAUS·Filed 2006·Application pending·0 cites
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