Assignee
EUV LLC
US79 patents
Top patents by PatentIndex Score
US6188150B1Feb 13, 2001
Light weight high-stiffness stage platen
EUV LLC91 citations98
US6285737B1Sep 4, 2001
Condenser for extreme-UV lithography with discharge source
EUV LLC116 citations97
US6031598AFeb 29, 2000
Extreme ultraviolet lithography machine
EUV LLC148 citations97
US6353271B1Mar 5, 2002
Extreme-UV scanning wafer and reticle stages
EUV LLC74 citations96
US6253464B1Jul 3, 2001
Method for protection of lithographic components from particle contamination
EUV LLC73 citations96
US6153044ANov 28, 2000
Protection of lithographic components from particle contamination
EUV LLC67 citations96
US6821682B1Nov 23, 2004
Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography
EUV LLC61 citations95
US6492067B1Dec 10, 2002
Removable pellicle for lithographic mask protection and handling
EUV LLC75 citations95
US6469827B1Oct 22, 2002
Diffraction spectral filter for use in extreme-UV lithography condenser
EUV LLC79 citations95
US6235434B1May 22, 2001
Method for mask repair using defect compensation
EUV LLC70 citations95
US6333775B1Dec 25, 2001
Extreme-UV lithography vacuum chamber zone seal
EUV LLC82 citations94
US6815129B1Nov 9, 2004
Compensation of flare-induced CD changes EUVL
EUV LLC57 citations93
US6700644B2Mar 2, 2004
Condenser for photolithography system
EUV LLC21 citations93
US6967168B2Nov 22, 2005
Method to repair localized amplitude defects in a EUV lithography mask blank
EUV LLC27 citations92
US6844272B2Jan 18, 2005
Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers
EUV LLC40 citations92
US6396068B1May 28, 2002
Illumination system having a plurality of movable sources
EUV LLC32 citations92
US6210865B1Apr 3, 2001
Extreme-UV lithography condenser
EUV LLC29 citations92
US6192897B1Feb 27, 2001
Apparatus and method for in-situ cleaning of resist outgassing windows
EUV LLC26 citations92
US6072157AJun 6, 2000
Thermophoretic vacuum wand
EUV LLC43 citations92
US6780496B2Aug 24, 2004
Optimized capping layers for EUV multilayers
EUV LLC43 citations91
US6664554B2Dec 16, 2003
Self-cleaning optic for extreme ultraviolet lithography
EUV LLC36 citations91
US6533952B2Mar 18, 2003
Mitigation of radiation induced surface contamination
EUV LLC20 citations91
US6229871B1May 8, 2001
Projection lithography with distortion compensation using reticle chuck contouring
EUV LLC25 citations91
US6225027B1May 1, 2001
Extreme-UV lithography system
EUV LLC36 citations91
US6198792B1Mar 6, 2001
Wafer chamber having a gas curtain for extreme-UV lithography
EUV LLC34 citations90
US6835415B2Dec 28, 2004
Compliant layer chucking surface
EUV LLC18 citations89
US6781135B2Aug 24, 2004
Universal EUV in-band intensity detector
EUV LLC20 citations89
US6772776B2Aug 10, 2004
Apparatus for in situ cleaning of carbon contaminated surfaces
EUV LLC23 citations89
US6368942B1Apr 9, 2002
Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer
EUV LLC27 citations89
US6232578B1May 15, 2001
Thermophoretic vacuum wand
EUV LLC17 citations89
US6714624B2Mar 30, 2004
Discharge source with gas curtain for protecting optics from particles
EUV LLC32 citations87
US6849859B2Feb 1, 2005
Fabrication of precision optics using an imbedded reference surface
EUV LLC20 citations86
US6285497B1Sep 4, 2001
Diffractive element in extreme-UV lithography condenser
EUV LLC20 citations86
US7081992B2Jul 25, 2006
Condenser optic with sacrificial reflective surface
EUV LLC11 citations83
US6798494B2Sep 28, 2004
Apparatus for generating partially coherent radiation
EUV LLC15 citations83
US6768567B2Jul 27, 2004
Synchrotron-based EUV lithography illuminator simulator
EUV LLC13 citations83
US6356618B1Mar 12, 2002
Extreme-UV electrical discharge source
EUV LLC24 citations83
US7196771B2Mar 27, 2007
Reticle stage based linear dosimeter
EUV LLC10 citations81
US6710351B2Mar 23, 2004
EUV mirror based absolute incident flux detector
EUV LLC15 citations81
US7147722B2Dec 12, 2006
Method for in-situ cleaning of carbon contaminated surfaces
EUV LLC15 citations80
US6861273B2Mar 1, 2005
Method of fabricating reflection-mode EUV diffusers
EUV LLC11 citations74
US6673525B1Jan 6, 2004
Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths
EUV LLC11 citations74
US7239443B2Jul 3, 2007
Condenser optic with sacrificial reflective surface
EUV LLC5 citations73
US7049033B2May 23, 2006
EUV lithography reticles fabricated without the use of a patterned absorber
EUV LLC9 citations73
US7027226B2Apr 11, 2006
Diffractive optical element for extreme ultraviolet wavefront control
EUV LLC7 citations73
US7016030B2Mar 21, 2006
Extended surface parallel coating inspection method
EUV LLC7 citations73
US6927887B2Aug 9, 2005
Holographic illuminator for synchrotron-based projection lithography systems
EUV LLC11 citations73
US6875543B2Apr 5, 2005
Etched-multilayer phase shifting masks for EUV lithography
EUV LLC9 citations73
US6859263B2Feb 22, 2005
Apparatus for generating partially coherent radiation
EUV LLC8 citations73
US6642995B2Nov 4, 2003
Mask-to-wafer alignment system
EUV LLC7 citations73
Showing the top 50 of 79 patents by PatentIndex Score.