Assignee
EUV LLC
US·79 granted patents·1,935 citations·filing 1998–2006
Top patents by PatentIndex Score
79 records- 0196US6285737B1Condenser for extreme-UV lithography with discharge sourceEUV LLC·Filed 2000·Granted Sep 4, 2001·116 cites·24 claims
- 0296US6253464B1Method for protection of lithographic components from particle contaminationEUV LLC·Filed 2000·Granted Jul 3, 2001·73 cites·5 claims
- 0394US6031598AExtreme ultraviolet lithography machineEUV LLC·Filed 1998·Granted Feb 29, 2000·148 cites·20 claims
- 0492US6821682B1Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithographyEUV LLC·Filed 2000·Granted Nov 23, 2004·61 cites·21 claims
- 0592US6188150B1Light weight high-stiffness stage platenEUV LLC·Filed 1999·Granted Feb 13, 2001·91 cites·42 claims
- 0691US6815129B1Compensation of flare-induced CD changes EUVLEUV LLC·Filed 2000·Granted Nov 9, 2004·57 cites·32 claims
- 0791US6664554B2Self-cleaning optic for extreme ultraviolet lithographyEUV LLC·Filed 2001·Granted Dec 16, 2003·36 cites·18 claims
- 0891US6469827B1Diffraction spectral filter for use in extreme-UV lithography condenserEUV LLC·Filed 2000·Granted Oct 22, 2002·79 cites·54 claims
- 0991US6333775B1Extreme-UV lithography vacuum chamber zone sealEUV LLC·Filed 1999·Granted Dec 25, 2001·82 cites·10 claims
- 1090US6844272B2Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layersEUV LLC·Filed 2002·Granted Jan 18, 2005·40 cites·19 claims
- 1189US6780496B2Optimized capping layers for EUV multilayersEUV LLC·Filed 2002·Granted Aug 24, 2004·43 cites·20 claims
- 1289US6492067B1Removable pellicle for lithographic mask protection and handlingEUV LLC·Filed 1999·Granted Dec 10, 2002·75 cites·21 claims
- 1389US6353271B1Extreme-UV scanning wafer and reticle stagesEUV LLC·Filed 1999·Granted Mar 5, 2002·74 cites·16 claims
- 1489US6153044AProtection of lithographic components from particle contaminationEUV LLC·Filed 1998·Granted Nov 28, 2000·67 cites·25 claims
- 1587US7196771B2Reticle stage based linear dosimeterEUV LLC·Filed 2005·Granted Mar 27, 2007·10 cites·21 claims
- 1687US6235434B1Method for mask repair using defect compensationEUV LLC·Filed 1998·Granted May 22, 2001·70 cites·4 claims
- 1784US6772776B2Apparatus for in situ cleaning of carbon contaminated surfacesEUV LLC·Filed 2001·Granted Aug 10, 2004·23 cites·13 claims
- 1884US6396068B1Illumination system having a plurality of movable sourcesEUV LLC·Filed 2000·Granted May 28, 2002·32 cites·21 claims
- 1983US6700644B2Condenser for photolithography systemEUV LLC·Filed 2002·Granted Mar 2, 2004·21 cites·50 claims
- 2083US6285497B1Diffractive element in extreme-UV lithography condenserEUV LLC·Filed 2000·Granted Sep 4, 2001·20 cites·19 claims
- 2182US6967168B2Method to repair localized amplitude defects in a EUV lithography mask blankEUV LLC·Filed 2001·Granted Nov 22, 2005·27 cites·26 claims
- 2282US6368942B1Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layerEUV LLC·Filed 2000·Granted Apr 9, 2002·27 cites·12 claims
- 2380US6714624B2Discharge source with gas curtain for protecting optics from particlesEUV LLC·Filed 2001·Granted Mar 30, 2004·32 cites·24 claims
- 2479US7147722B2Method for in-situ cleaning of carbon contaminated surfacesEUV LLC·Filed 2004·Granted Dec 12, 2006·15 cites·20 claims
- 2579US6849859B2Fabrication of precision optics using an imbedded reference surfaceEUV LLC·Filed 2001·Granted Feb 1, 2005·20 cites·31 claims
- 2678US6072157AThermophoretic vacuum wandEUV LLC·Filed 1998·Granted Jun 6, 2000·43 cites·24 claims
- 2777US6232578B1Thermophoretic vacuum wandEUV LLC·Filed 2000·Granted May 15, 2001·17 cites·23 claims
- 2876US6798494B2Apparatus for generating partially coherent radiationEUV LLC·Filed 2001·Granted Sep 28, 2004·15 cites·33 claims
- 2976US6781135B2Universal EUV in-band intensity detectorEUV LLC·Filed 2002·Granted Aug 24, 2004·20 cites·19 claims
- 3076US6710351B2EUV mirror based absolute incident flux detectorEUV LLC·Filed 2001·Granted Mar 23, 2004·15 cites·32 claims
- 3174US6835415B2Compliant layer chucking surfaceEUV LLC·Filed 2003·Granted Dec 28, 2004·18 cites·14 claims
- 3274US6768567B2Synchrotron-based EUV lithography illuminator simulatorEUV LLC·Filed 2002·Granted Jul 27, 2004·13 cites·29 claims
- 3374US6192897B1Apparatus and method for in-situ cleaning of resist outgassing windowsEUV LLC·Filed 1999·Granted Feb 27, 2001·26 cites·23 claims
- 3473US6225027B1Extreme-UV lithography systemEUV LLC·Filed 1999·Granted May 1, 2001·36 cites·32 claims
- 3572US6198792B1Wafer chamber having a gas curtain for extreme-UV lithographyEUV LLC·Filed 1998·Granted Mar 6, 2001·34 cites·25 claims
- 3671US7049033B2EUV lithography reticles fabricated without the use of a patterned absorberEUV LLC·Filed 2003·Granted May 23, 2006·9 cites·14 claims
- 3771US6673525B1Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengthsEUV LLC·Filed 2000·Granted Jan 6, 2004·11 cites·14 claims
- 3871US6545745B2Extreme-UV lithography vacuum chamber zone sealEUV LLC·Filed 2001·Granted Apr 8, 2003·9 cites·25 claims
- 3971US6356618B1Extreme-UV electrical discharge sourceEUV LLC·Filed 2000·Granted Mar 12, 2002·24 cites·19 claims
- 4070US6927887B2Holographic illuminator for synchrotron-based projection lithography systemsEUV LLC·Filed 2001·Granted Aug 9, 2005·11 cites·30 claims
- 4169US6563907B1Radiation source with shaped emissionEUV LLC·Filed 2001·Granted May 13, 2003·12 cites·34 claims
- 4269US6210865B1Extreme-UV lithography condenserEUV LLC·Filed 1999·Granted Apr 3, 2001·29 cites·12 claims
- 4368US7016030B2Extended surface parallel coating inspection methodEUV LLC·Filed 2003·Granted Mar 21, 2006·7 cites·43 claims
- 4466US6859263B2Apparatus for generating partially coherent radiationEUV LLC·Filed 2003·Granted Feb 22, 2005·8 cites·23 claims
- 4566US6229871B1Projection lithography with distortion compensation using reticle chuck contouringEUV LLC·Filed 1999·Granted May 8, 2001·25 cites·20 claims
- 4665US6861273B2Method of fabricating reflection-mode EUV diffusersEUV LLC·Filed 2001·Granted Mar 1, 2005·11 cites·66 claims
- 4764US7273289B2Vacuum compatible, high-speed, 2-D mirror tilt stageEUV LLC·Filed 2005·Granted Sep 25, 2007·3 cites·20 claims
- 4864US6906781B2Reticle stage based linear dosimeterEUV LLC·Filed 2002·Granted Jun 14, 2005·7 cites·14 claims
- 4964US6549264B2Extreme-UV lithography vacuum chamber zone sealEUV LLC·Filed 2001·Granted Apr 15, 2003·6 cites·25 claims
- 5063US7027226B2Diffractive optical element for extreme ultraviolet wavefront controlEUV LLC·Filed 2001·Granted Apr 11, 2006·7 cites·19 claims
Showing the top 50 of 79 patent records by PatentIndex Score.
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