Assignee
FORSTER JOHN C
US4 patents
Top patents by PatentIndex Score
US8920611B2Dec 30, 2014
Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
FORSTER JOHN C10 citations81
US9017533B2Apr 28, 2015
Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
FORSTER JOHN C3 citations61
US8992747B2Mar 31, 2015
Apparatus and method for improved darkspace gap design in RF sputtering chamber
FORSTER JOHN C0 citations51
US9355819B2May 31, 2016
Elongated capacitively coupled plasma source for high temperature low pressure environments
FORSTER JOHN C1 citations50