Assignee
FU PENG-FEI
US·10 granted patents·2 pending applications·52 citations·filing 2005–2012
Top patents by PatentIndex Score
12 records- 0194US8293354B2UV curable silsesquioxane resins for nanoprint lithographyFU PENG-FEI·Filed 2009·Granted Oct 23, 2012·20 cites·18 claims
- 0286US8809482B2Silsesquioxane resinsFU PENG-FEI·Filed 2009·Granted Aug 19, 2014·7 cites·13 claims
- 0383US9023433B2Silsesquioxane resins and method of using them to form an antireflective coatingFU PENG-FEI·Filed 2008·Granted May 5, 2015·7 cites·7 claims
- 0483US8653217B2Method for forming anti-reflective coatingFU PENG-FEI·Filed 2011·Granted Feb 18, 2014·3 cites·4 claims
- 0582US8728335B2Method and materials for double patterningFU PENG-FEI·Filed 2010·Granted May 20, 2014·7 cites·18 claims
- 0678US8263312B2Antireflective coating materialFU PENG-FEI·Filed 2006·Granted Sep 11, 2012·5 cites·25 claims
- 0767US8691389B2Method of nanopatterning, a cured resist film use therein, and an article including the resist filmFU PENG FEI·Filed 2005·Granted Apr 8, 2014·2 cites·7 claims
- 0864US9086626B2Photo-patternable and developable silsesquioxane resins for use in device fabricationFU PENG-FEI·Filed 2012·Granted Jul 21, 2015·1 cites·9 claims
- 0956US8241707B2Silsesquioxane resinsFU PENG-FEI·Filed 2009·Granted Aug 14, 2012·0 cites·34 claims
- 1053US8507179B2Switchable antireflective coatingsFU PENG-FEI·Filed 2009·Granted Aug 13, 2013·0 cites·12 claims
- 1147US2011236835A1Silsesquioxane ResinsFU PENG-FEI·Filed 2009·Application pending·0 cites
- 1238US2013189495A1Nanoscale PhotolithographyFU PENG-FEI·Filed 2011·Application pending·0 cites
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