Assignee
GENUS INC
US66 patents
Top patents by PatentIndex Score
US6638859B2Oct 28, 2003
Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
GENUS INC154 citations99
US6602784B2Aug 5, 2003
Radical-assisted sequential CVD
GENUS INC96 citations99
US6551399B1Apr 22, 2003
Fully integrated process for MIM capacitors using atomic layer deposition
GENUS INC169 citations99
US6503330B1Jan 7, 2003
Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
GENUS INC616 citations99
US6475910B1Nov 5, 2002
Radical-assisted sequential CVD
GENUS INC263 citations99
US6451695B2Sep 17, 2002
Radical-assisted sequential CVD
GENUS INC372 citations99
US6200893B1Mar 13, 2001
Radical-assisted sequential CVD
GENUS INC1,023 citations99
US6617173B1Sep 9, 2003
Integration of ferromagnetic films with ultrathin insulating film using atomic layer deposition
GENUS INC78 citations98
US6540838B2Apr 1, 2003
Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
GENUS INC447 citations98
US6451119B2Sep 17, 2002
Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
GENUS INC341 citations98
US6305314B1Oct 23, 2001
Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
GENUS INC487 citations98
US6174377B1Jan 16, 2001
Processing chamber for atomic layer deposition processes
GENUS INC639 citations98
US5879459AMar 9, 1999
Vertically-stacked process reactor and cluster tool system for atomic layer deposition
GENUS INC1,209 citations98
US6387185B2May 14, 2002
Processing chamber for atomic layer deposition processes
GENUS INC123 citations97
US6206972B1Mar 27, 2001
Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
GENUS INC301 citations97
US5855675AJan 5, 1999
Multipurpose processing chamber for chemical vapor deposition processes
GENUS INC230 citations97
US6818067B2Nov 16, 2004
Processing chamber for atomic layer deposition processes
GENUS INC75 citations96
US6638862B2Oct 28, 2003
Radical-assisted sequential CVD
GENUS INC58 citations96
US6630401B2Oct 7, 2003
Radical-assisted sequential CVD
GENUS INC52 citations96
US5501993AMar 26, 1996
Method of constructing CMOS vertically modulated wells (VMW) by clustered MeV BILLI (buried implanted layer for lateral isolation) implantation
GENUS INC102 citations96
US5294568AMar 15, 1994
Method of selective etching native oxide
GENUS INC111 citations96
US4973841ANov 27, 1990
Precision ultra-sensitive trace detector for carbon-14 when it is at concentration close to that present in recent organic materials
GENUS INC72 citations96
US4851295AJul 25, 1989
Low resistivity tungsten silicon composite film
GENUS INC59 citations96
US4629635ADec 16, 1986
Process for depositing a low resistivity tungsten silicon composite film on a substrate
GENUS INC90 citations96
US4550684ANov 5, 1985
Cooled optical window for semiconductor wafer heating
GENUS INC77 citations96
US6905547B1Jun 14, 2005
Method and apparatus for flexible atomic layer deposition
GENUS INC78 citations95
US5383971AJan 24, 1995
Differential pressure CVD chuck
GENUS INC98 citations95
US5222567AJun 29, 1993
Power assist device for a wheelchair
GENUS INC226 citations95
US5215639AJun 1, 1993
Composite sputtering target structures and process for producing such structures
GENUS INC94 citations95
US5094885AMar 10, 1992
Differential pressure cvd chuck
GENUS INC81 citations95
US7018940B2Mar 28, 2006
Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
GENUS INC61 citations94
US6720259B2Apr 13, 2004
Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition
GENUS INC56 citations94
US6626998B1Sep 30, 2003
Plasma generator assembly for use in CVD and PECVD processes
GENUS INC49 citations94
US6616766B2Sep 9, 2003
Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
GENUS INC62 citations94
US5447570ASep 5, 1995
Purge gas in wafer coating area selection
GENUS INC88 citations94
US4795299AJan 3, 1989
Dial deposition and processing apparatus
GENUS INC63 citations94
US4565157AJan 21, 1986
Method and apparatus for deposition of tungsten silicides
GENUS INC110 citations94
US6863021B2Mar 8, 2005
Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)
GENUS INC29 citations93
US5762755AJun 9, 1998
Organic preclean for improving vapor phase wafer etch uniformity
GENUS INC72 citations93
US5319212AJun 7, 1994
Method of monitoring ion beam current in ion implantation apparatus for use in manufacturing semiconductors
GENUS INC82 citations93
US4690746ASep 1, 1987
Interlayer dielectric process
GENUS INC312 citations93
US6897119B1May 24, 2005
Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
GENUS INC46 citations92
US5306922AApr 26, 1994
Production of high beam currents at low energies for use in ion implantation systems
GENUS INC23 citations92
US4932358AJun 12, 1990
Perimeter wafer seal
GENUS INC54 citations92
US4680447AJul 14, 1987
Cooled optical window for semiconductor wafer heating
GENUS INC43 citations92
US6902624B2Jun 7, 2005
Massively parallel atomic layer deposition/chemical vapor deposition system
GENUS INC67 citations91
US5858471AJan 12, 1999
Selective plasma deposition
GENUS INC81 citations91
US5814866ASep 29, 1998
Semiconductor device having at least one field oxide area and CMOS vertically modulated wells (VMW) with a buried implanted layer for lateral isolation having a first portion below a well, a second portion forming another, adjacent well, and a vertical po
GENUS INC45 citations91
US5330607AJul 19, 1994
Sacrificial metal etchback system
GENUS INC23 citations91
US5272112ADec 21, 1993
Low-temperature low-stress blanket tungsten film
GENUS INC22 citations91
Showing the top 50 of 66 patents by PatentIndex Score.