P

Assignee

GLOBALFOUNDRIES INC

KY4,127 patents

Top patents by PatentIndex Score

US10332963B1Jun 25, 2019

Uniformity tuning of variable-height features formed in trenches

GLOBALFOUNDRIES INC346 citations99
US9947804B1Apr 17, 2018

Methods of forming nanosheet transistor with dielectric isolation of source-drain regions and related structure

GLOBALFOUNDRIES INC154 citations99
US9748145B1Aug 29, 2017

Semiconductor devices with varying threshold voltage and fabrication methods thereof

GLOBALFOUNDRIES INC494 citations99
US9620481B2Apr 11, 2017

Substrate bonding with diffusion barrier structures

GLOBALFOUNDRIES INC220 citations99
US9412616B1Aug 9, 2016

Methods of forming single and double diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products

GLOBALFOUNDRIES INC148 citations99
US9111907B2Aug 18, 2015

Silicide protection during contact metallization and resulting semiconductor structures

GLOBALFOUNDRIES INC174 citations99
US10840146B1Nov 17, 2020

Structures and SRAM bit cells with a buried cross-couple interconnect

GLOBALFOUNDRIES INC62 citations98
US10510620B1Dec 17, 2019

Work function metal patterning for N-P space between active nanostructures

GLOBALFOUNDRIES INC126 citations98
US10429582B1Oct 1, 2019

Waveguide-to-waveguide couplers with multiple tapers

GLOBALFOUNDRIES INC59 citations98
US10388732B1Aug 20, 2019

Nanosheet field-effect transistors including a two-dimensional semiconducting material

GLOBALFOUNDRIES INC88 citations98
US10332803B1Jun 25, 2019

Hybrid gate-all-around (GAA) field effect transistor (FET) structure and method of forming

GLOBALFOUNDRIES INC83 citations98
US10192867B1Jan 29, 2019

Complementary FETs with wrap around contacts and method of forming same

GLOBALFOUNDRIES INC134 citations98
US10192819B1Jan 29, 2019

Integrated circuit structure incorporating stacked field effect transistors

GLOBALFOUNDRIES INC76 citations98
US10170484B1Jan 1, 2019

Integrated circuit structure incorporating multiple gate-all-around field effect transistors having different drive currents and method

GLOBALFOUNDRIES INC61 citations98
US10103238B1Oct 16, 2018

Nanosheet field-effect transistor with full dielectric isolation

GLOBALFOUNDRIES INC57 citations98
US10090193B1Oct 2, 2018

Integrated circuit structure incorporating a stacked pair of field effect transistors and a buried interconnect and method

GLOBALFOUNDRIES INC68 citations98
US10014390B1Jul 3, 2018

Inner spacer formation for nanosheet field-effect transistors with tall suspensions

GLOBALFOUNDRIES INC74 citations98
US9991352B1Jun 5, 2018

Methods of forming a nano-sheet transistor device with a thicker gate stack and the resulting device

GLOBALFOUNDRIES INC90 citations98
US9853006B2Dec 26, 2017

Semiconductor device contact structure having stacked nickel, copper, and tin layers

GLOBALFOUNDRIES INC47 citations98
US9847390B1Dec 19, 2017

Self-aligned wrap-around contacts for nanosheet devices

GLOBALFOUNDRIES INC74 citations98
US9780208B1Oct 3, 2017

Method and structure of forming self-aligned RMG gate for VFET

GLOBALFOUNDRIES INC60 citations98
US9773708B1Sep 26, 2017

Devices and methods of forming VFET with self-aligned replacement metal gates aligned to top spacer post top source drain EPI

GLOBALFOUNDRIES INC75 citations98
US9653583B1May 16, 2017

Methods of forming diffusion breaks on integrated circuit products comprised of finFET devices

GLOBALFOUNDRIES INC79 citations98
US9640636B1May 2, 2017

Methods of forming replacement gate structures and bottom and top source/drain regions on a vertical transistor device

GLOBALFOUNDRIES INC88 citations98
US9613861B2Apr 4, 2017

Damascene wires with top via structures

GLOBALFOUNDRIES INC60 citations98
US9576952B2Feb 21, 2017

Integrated circuits with varying gate structures and fabrication methods

GLOBALFOUNDRIES INC421 citations98
US9397003B1Jul 19, 2016

Method for forming source/drain contacts during CMOS integration using confined epitaxial growth techniques

GLOBALFOUNDRIES INC79 citations98
US9396991B2Jul 19, 2016

Multilayered contact structure having nickel, copper, and nickel-iron layers

GLOBALFOUNDRIES INC46 citations98
US9368496B1Jun 14, 2016

Method for uniform recess depth and fill in single diffusion break for fin-type process and resulting devices

GLOBALFOUNDRIES INC77 citations98
US9369488B2Jun 14, 2016

Policy enforcement using natural language processing

GLOBALFOUNDRIES INC306 citations98
US9361921B2Jun 7, 2016

Tape servo track write compensation

GLOBALFOUNDRIES INC44 citations98
US9362181B1Jun 7, 2016

Methods of forming diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products

GLOBALFOUNDRIES INC69 citations98
US9362180B2Jun 7, 2016

Integrated circuit having multiple threshold voltages

GLOBALFOUNDRIES INC425 citations98
US9337099B1May 10, 2016

Special constructs for continuous non-uniform active region FinFET standard cells

GLOBALFOUNDRIES INC53 citations98
US9245885B1Jan 26, 2016

Methods of forming lateral and vertical FinFET devices and the resulting product

GLOBALFOUNDRIES INC60 citations98
US9093467B1Jul 28, 2015

Methods of forming gate structures for semiconductor devices using a replacement gate technique and the resulting devices

GLOBALFOUNDRIES INC68 citations98
US9012319B1Apr 21, 2015

Methods of forming gate structures with multiple work functions and the resulting products

GLOBALFOUNDRIES INC105 citations98
US8954913B1Feb 10, 2015

Methods of generating circuit layouts that are to be manufactured using SADP routing techniques and virtual non-mandrel mask rules

GLOBALFOUNDRIES INC43 citations98
US8703557B1Apr 22, 2014

Methods of removing dummy fin structures when forming finFET devices

GLOBALFOUNDRIES INC63 citations98
US8674413B1Mar 18, 2014

Methods of forming fins and isolation regions on a FinFET semiconductor device

GLOBALFOUNDRIES INC54 citations98
US7829460B2Nov 9, 2010

Method of manufracturing increasing reliability of copper-based metallization structures in a microstructure device by using aluminum nitride

GLOBALFOUNDRIES INC467 citations98
US10510622B1Dec 17, 2019

Vertically stacked complementary-FET device with independent gate control

GLOBALFOUNDRIES INC46 citations97
US10483154B1Nov 19, 2019

Front-end-of-line device structure and method of forming such a front-end-of-line device structure

GLOBALFOUNDRIES INC399 citations97
US10332747B1Jun 25, 2019

Selective titanium nitride deposition using oxides of lanthanum masks

GLOBALFOUNDRIES INC287 citations97
US10256158B1Apr 9, 2019

Insulated epitaxial structures in nanosheet complementary field effect transistors

GLOBALFOUNDRIES INC68 citations97
US10192779B1Jan 29, 2019

Bulk substrates with a self-aligned buried polycrystalline layer

GLOBALFOUNDRIES INC71 citations97
US10026824B1Jul 17, 2018

Air-gap gate sidewall spacer and method

GLOBALFOUNDRIES INC53 citations97
US9984936B1May 29, 2018

Methods of forming an isolated nano-sheet transistor device and the resulting device

GLOBALFOUNDRIES INC91 citations97
US9911736B1Mar 6, 2018

Method of forming field effect transistors with replacement metal gates and contacts and resulting structure

GLOBALFOUNDRIES INC86 citations97
US9536793B1Jan 3, 2017

Self-aligned gate-first VFETs using a gate spacer recess

GLOBALFOUNDRIES INC74 citations97

Showing the top 50 of 4,127 patents by PatentIndex Score.