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US10 patents
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US8119529B2Feb 21, 2012
Method for chemical mechanical polishing a substrate
GUO YI9 citations84
US8492277B2Jul 23, 2013
Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
GUO YI9 citations82
US8431490B2Apr 30, 2013
Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removal
GUO YI5 citations71
US8440094B1May 14, 2013
Method of polishing a substrate
GUO YI3 citations61
US8232208B2Jul 31, 2012
Stabilized chemical mechanical polishing composition and method of polishing a substrate
GUO YI3 citations61
US8444728B2May 21, 2013
Stabilized chemical mechanical polishing composition and method of polishing a substrate
GUO YI1 citations51
US8435420B1May 7, 2013
Method of polishing using tunable polishing formulation
GUO YI1 citations51
US8496843B2Jul 30, 2013
Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
GUO YI0 citations40
US8491808B2Jul 23, 2013
Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride
GUO YI0 citations40
US8865013B2Oct 21, 2014
Method for chemical mechanical polishing tungsten
GUO YI0 citations36