Assignee
HANAWA HIROJI
US·5 granted patents·5 pending applications·83 citations·filing 2004–2011
Top patents by PatentIndex Score
10 records- 0196US8709924B2Method for conformal plasma immersed ion implantation assisted by atomic layer depositionHANAWA HIROJI·Filed 2011·Granted Apr 29, 2014·30 cites·7 claims
- 0290US8980379B2Gas distribution showerhead and method of cleaningHANAWA HIROJI·Filed 2010·Granted Mar 17, 2015·11 cites·13 claims
- 0389US8058156B2Plasma immersion ion implantation reactor having multiple ion shower gridsHANAWA HIROJI·Filed 2004·Granted Nov 15, 2011·32 cites·118 claims
- 0487US8513939B2In-situ VHF voltage sensor for a plasma reactorHANAWA HIROJI·Filed 2011·Granted Aug 20, 2013·6 cites·10 claims
- 0576US8455374B2Radiation heating efficiency by increasing optical absorption of a silicon containing materialHANAWA HIROJI·Filed 2011·Granted Jun 4, 2013·4 cites·17 claims
- 0653US2009203197A1Novel method for conformal plasma immersed ion implantation assisted by atomic layer depositionHANAWA HIROJI·Filed 2008·Application pending·0 cites
- 0753US2007212987A1Monitoring a metal layer during chemical mechanical polishingHANAWA HIROJI·Filed 2007·Application pending·0 cites
- 0852US2010015357A1Capacitively coupled plasma etch chamber with multiple rf feedsHANAWA HIROJI·Filed 2008·Application pending·0 cites
- 0948US2012052216A1Gas distribution showerhead with high emissivity surfaceHANAWA HIROJI·Filed 2011·Application pending·0 cites
- 1044US2006009128A1Eddy current sensing of metal removal for chemical mechanical polishingHANAWA HIROJI·Filed 2005·Application pending·0 cites
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