Assignee
HATA MITSUHIRO
JP·1 granted patent·4 pending applications·1 citations·filing 2005–2009
Top patents by PatentIndex Score
5 records- 0155US8062829B2Chemically amplified resist composition and chemically amplified resist composition for immersion lithographyHATA MITSUHIRO·Filed 2009·Granted Nov 22, 2011·1 cites·12 claims
- 0241US2010279226A1Resist processing methodHATA MITSUHIRO·Filed 2008·Application pending·0 cites
- 0341US2006111547A1Bottom layer resist polymers for photolithography and methods of manufacturing the sameHATA MITSUHIRO·Filed 2005·Application pending·0 cites
- 0440US2011091820A1Resist processing methodHATA MITSUHIRO·Filed 2009·Application pending·0 cites
- 0535US2006275697A1Top coating composition for photoresist and method of forming photoresist pattern using the sameHATA MITSUHIRO·Filed 2006·Application pending·0 cites
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