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US9360753B2Jun 7, 2016
Resist composition and patterning process
HATAKEYAMA JUN22 citations93
US8057982B2Nov 15, 2011
Monomer, resist composition, and patterning process
HATAKEYAMA JUN33 citations93
US9164383B2Oct 20, 2015
Resist composition and patterning process
HATAKEYAMA JUN8 citations84
US9017918B2Apr 28, 2015
Monomer, polymer, chemically amplified positive resist composition, and patterning process
HATAKEYAMA JUN8 citations84
US8921026B2Dec 30, 2014
Basic compound, chemically amplified resist composition, and patterning process
HATAKEYAMA JUN9 citations84
US8895231B2Nov 25, 2014
Patterning process and resist composition
HATAKEYAMA JUN7 citations84
US8507173B2Aug 13, 2013
Patterning process
HATAKEYAMA JUN10 citations84
US8507175B2Aug 13, 2013
Patterning process and resist composition
HATAKEYAMA JUN13 citations84
US8450048B2May 28, 2013
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
HATAKEYAMA JUN13 citations84
US8440386B2May 14, 2013
Patterning process, resist composition, and acetal compound
HATAKEYAMA JUN10 citations84
US8426115B2Apr 23, 2013
Patterning process and resist composition
HATAKEYAMA JUN9 citations84
US8323872B2Dec 4, 2012
Resist protective coating material and patterning process
HATAKEYAMA JUN15 citations84
US8216774B2Jul 10, 2012
Patterning process
HATAKEYAMA JUN7 citations84
US8198016B2Jun 12, 2012
Patterning process
HATAKEYAMA JUN13 citations84
US8105760B2Jan 31, 2012
Patterning process and pattern surface coating composition
HATAKEYAMA JUN11 citations84
US8088554B2Jan 3, 2012
Bottom resist layer composition and patterning process using the same
HATAKEYAMA JUN16 citations84
US8574817B2Nov 5, 2013
Positive resist composition and patterning process
HATAKEYAMA JUN5 citations73
US8338078B2Dec 25, 2012
Photoresist undercoat-forming material and patterning process
HATAKEYAMA JUN6 citations73
US8129086B2Mar 6, 2012
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
HATAKEYAMA JUN6 citations73
US9091914B2Jul 28, 2015
Resist composition and patterning process
HATAKEYAMA JUN2 citations63
US9029064B2May 12, 2015
Patterning process and resist composition
HATAKEYAMA JUN2 citations63
US8841061B2Sep 23, 2014
Positive resist composition and patterning process
HATAKEYAMA JUN3 citations63
US8741554B2Jun 3, 2014
Patterning process and resist composition
HATAKEYAMA JUN2 citations63
US8735046B2May 27, 2014
Positive resist composition and patterning process
HATAKEYAMA JUN2 citations63
US8617800B2Dec 31, 2013
Patterning process
HATAKEYAMA JUN3 citations63
US8501384B2Aug 6, 2013
Positive resist composition and patterning process
HATAKEYAMA JUN4 citations63
US8492078B2Jul 23, 2013
Patterning process
HATAKEYAMA JUN3 citations63
US8450042B2May 28, 2013
Positive resist composition and patterning process
HATAKEYAMA JUN4 citations63
US8288072B2Oct 16, 2012
Resist lower layer film-formed substrate
HATAKEYAMA JUN4 citations63
US8211618B2Jul 3, 2012
Positive resist composition and patterning process
HATAKEYAMA JUN3 citations63
US8088537B2Jan 3, 2012
Resist top coat composition and patterning process
HATAKEYAMA JUN2 citations63
US8703404B2Apr 22, 2014
Patterning process
HATAKEYAMA JUN2 citations62
US8623590B2Jan 7, 2014
Pattern forming process
HATAKEYAMA JUN2 citations62
US8105764B2Jan 31, 2012
Patterning process
HATAKEYAMA JUN2 citations62
US8778592B2Jul 15, 2014
Positive resist composition and patterning process
HATAKEYAMA JUN3 citations61
US9316909B2Apr 19, 2016
Patterning process
HATAKEYAMA JUN1 citations52
US8999630B2Apr 7, 2015
Patterning process and resist composition
HATAKEYAMA JUN1 citations52
US8828641B2Sep 9, 2014
Chemically amplified resist composition and patterning process
HATAKEYAMA JUN0 citations52
US8828647B2Sep 9, 2014
Patterning process and resist composition
HATAKEYAMA JUN1 citations52
US8808966B2Aug 19, 2014
Positive resist composition and patterning process
HATAKEYAMA JUN0 citations52
US8790866B2Jul 29, 2014
Patterning process and resist composition
HATAKEYAMA JUN0 citations52
US8753805B2Jun 17, 2014
Patterning process and resist composition
HATAKEYAMA JUN0 citations52
US8652756B2Feb 18, 2014
Positive resist composition and patterning process
HATAKEYAMA JUN0 citations52
US8574816B2Nov 5, 2013
Positive resist composition and patterning process
HATAKEYAMA JUN0 citations52
US8865390B2Oct 21, 2014
Patterning process and resist composition
HATAKEYAMA JUN0 citations42
US8703408B2Apr 22, 2014
Patterning process
HATAKEYAMA JUN0 citations42
US8101341B2Jan 24, 2012
Patterning process
HATAKEYAMA JUN0 citations42
US8741548B2Jun 3, 2014
Patterning process
HATAKEYAMA JUN0 citations41
US8192921B2Jun 5, 2012
Patterning process
HATAKEYAMA JUN0 citations41