Assignee
HAYASHI HIDEKAZU
JP·11 granted patents·2 pending applications·25 citations·filing 2009–2012
Top patents by PatentIndex Score
13 records- 0190US8563163B2Tool batteriesHAYASHI HIDEKAZU·Filed 2011·Granted Oct 22, 2013·6 cites·12 claims
- 0286US9315916B2Electrode structure, substrate holder, and method for forming anodic oxidation layerHAYASHI HIDEKAZU·Filed 2011·Granted Apr 19, 2016·3 cites·20 claims
- 0384US8641884B2Mold manufacturing method and electrode structure for use thereinHAYASHI HIDEKAZU·Filed 2010·Granted Feb 4, 2014·5 cites·5 claims
- 0476US8580135B2Die and method of manufacturing sameHAYASHI HIDEKAZU·Filed 2010·Granted Nov 12, 2013·4 cites·7 claims
- 0574US8889220B2Mold release treatment method, mold, method for producing anti-reflective film, mold release treatment device, and washing/drying device for moldHAYASHI HIDEKAZU·Filed 2011·Granted Nov 18, 2014·2 cites·9 claims
- 0669US8760655B2Die inspection methodHAYASHI HIDEKAZU·Filed 2011·Granted Jun 24, 2014·1 cites·7 claims
- 0768US8294282B2Semiconductor device and adhesive sheetHAYASHI HIDEKAZU·Filed 2010·Granted Oct 23, 2012·3 cites·8 claims
- 0862US10199240B2Substrate processing method, substrate processing apparatus, and storage mediumHAYASHI HIDEKAZU·Filed 2012·Granted Feb 5, 2019·1 cites·7 claims
- 0961US8758589B2Antireflection film, optical element comprising antireflection film, stamper, process for producing stamper, and process for producing antireflection filmHAYASHI HIDEKAZU·Filed 2009·Granted Jun 24, 2014·0 cites·3 claims
- 1055US9133558B2Method for producing anodized filmHAYASHI HIDEKAZU·Filed 2011·Granted Sep 15, 2015·0 cites·9 claims
- 1142US9437416B2Supercritical drying method for semiconductor substrateHAYASHI HIDEKAZU·Filed 2011·Granted Sep 6, 2016·0 cites·11 claims
- 1242US2012186097A1Supercritical drying device and methodHAYASHI HIDEKAZU·Filed 2011·Application pending·0 cites
- 1336US2011289793A1Supercritical drying methodHAYASHI HIDEKAZU·Filed 2010·Application pending·0 cites
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