Assignee

HC STARCK INC

US·1 granted patent·2 citations·filing 2018–2018

Technology mixC25D1 G02F1 G06F1 H01L1 H10D1 H10H1

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0177US10739879B2Current-induced dark layer formation for metallization in electronic devicesHC STARCK INC·Filed 2018·Granted Aug 11, 2020·2 cites·30 claims

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