Assignee
HEMLOCK SEMICONDUCTOR CORP
US·28 granted patents·8 pending applications·539 citations·filing 1988–2016
Top patents by PatentIndex Score
36 records- 0194US7927984B2Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall depositionHEMLOCK SEMICONDUCTOR CORP·Filed 2008·Granted Apr 19, 2011·22 cites·34 claims
- 0288US5906799AChlorosilane and hydrogen reactorHEMLOCK SEMICONDUCTOR CORP·Filed 1992·Granted May 25, 1999·103 cites·21 claims
- 0386US7935327B2Silicon production with a fluidized bed reactor integrated into a siemens-type processHEMLOCK SEMICONDUCTOR CORP·Filed 2006·Granted May 3, 2011·7 cites·34 claims
- 0486US5108512ACleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pelletsHEMLOCK SEMICONDUCTOR CORP·Filed 1991·Granted Apr 28, 1992·78 cites·10 claims
- 0583US8021483B2Flowable chips and methods for the preparation and use of same, and apparatus for use in the methodsHEMLOCK SEMICONDUCTOR CORP·Filed 2002·Granted Sep 20, 2011·19 cites·10 claims
- 0681US5165548ARotary silicon screenHEMLOCK SEMICONDUCTOR CORP·Filed 1991·Granted Nov 24, 1992·45 cites·7 claims
- 0778US5422088AProcess for hydrogenation of tetrachlorosilaneHEMLOCK SEMICONDUCTOR CORP·Filed 1994·Granted Jun 6, 1995·47 cites·7 claims
- 0877US5108720AFloat zone processing of particulate siliconHEMLOCK SEMICONDUCTOR CORP·Filed 1991·Granted Apr 28, 1992·38 cites·9 claims
- 0976US5118485ARecovery of lower-boiling silanes in a cvd processHEMLOCK SEMICONDUCTOR CORP·Filed 1988·Granted Jun 2, 1992·38 cites·24 claims
- 1074US9909231B2Flowable chips and methods for the preparation and use of same, and apparatus for use in the methodsHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Granted Mar 6, 2018·0 cites·4 claims
- 1170US5126112AGraphite and carbon felt insulating system for chlorosilane and hydrogen reactorHEMLOCK SEMICONDUCTOR CORP·Filed 1991·Granted Jun 30, 1992·30 cites·15 claims
- 1267US10345211B2Method of determining a concentration of a material not dissolved by silicon etchants contaminating a productHEMLOCK SEMICONDUCTOR CORP·Filed 2016·Granted Jul 9, 2019·1 cites·18 claims
- 1367US10267574B2Heat exchangerHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Granted Apr 23, 2019·3 cites·14 claims
- 1463US7080742B2Method and apparatus for improving silicon processing efficiencyHEMLOCK SEMICONDUCTOR CORP·Filed 2004·Granted Jul 25, 2006·8 cites·13 claims
- 1562US5118486ASeparation by atomization of by-product stream into particulate silicon and silanesHEMLOCK SEMICONDUCTOR CORP·Filed 1991·Granted Jun 2, 1992·25 cites·21 claims
- 1661US6605149B2Method of stacking polycrystalline silicon in process for single crystal productionHEMLOCK SEMICONDUCTOR CORP·Filed 2002·Granted Aug 12, 2003·4 cites·22 claims
- 1761US2014353290A1Electrode for use with a manufacturing apparatus for depositing a materialHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Application pending·0 cites
- 1858US10105669B2Tapered fluidized bed reactor and process for its useHEMLOCK SEMICONDUCTOR CORP·Filed 2013·Granted Oct 23, 2018·0 cites·8 claims
- 1958US5361128AMethod for analyzing irregular shaped chunked silicon for contaminatesHEMLOCK SEMICONDUCTOR CORP·Filed 1992·Granted Nov 1, 1994·15 cites·6 claims
- 2057US5851303AMethod for removing metal surface contaminants from siliconHEMLOCK SEMICONDUCTOR CORP·Filed 1996·Granted Dec 22, 1998·26 cites·20 claims
- 2155US2015284873A1Methods of forming and analyzing doped siliconHEMLOCK SEMICONDUCTOR CORP·Filed 2013·Application pending·0 cites
- 2252US10266414B2Susceptor arrangement for a reactor and method of heating a process gas for a reactorHEMLOCK SEMICONDUCTOR CORP·Filed 2016·Granted Apr 23, 2019·0 cites·16 claims
- 2351US2016320275A1Method for determining a concentration of metal impurities contaminating a silicon productHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Application pending·0 cites
- 2450US2014353147A1Electrode for use with manufacturing apparatusHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Application pending·0 cites
- 2549US2015232987A1Manufacturing apparatus for depositing a material and a socket for use thereinHEMLOCK SEMICONDUCTOR CORP·Filed 2013·Application pending·0 cites
- 2648US2014225030A1Method of controlling the crystallinity of a silicon powderHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Application pending·0 cites
- 2745US4912528ATrace metals analysis in semiconductor materialHEMLOCK SEMICONDUCTOR CORP·Filed 1988·Granted Mar 27, 1990·9 cites·10 claims
- 2844US9687876B2Method of repairing and/or protecting a surface in a reactorHEMLOCK SEMICONDUCTOR CORP·Filed 2013·Granted Jun 27, 2017·0 cites·20 claims
- 2943US2016037586A1Induction heating apparatusHEMLOCK SEMICONDUCTOR CORP·Filed 2014·Application pending·0 cites
- 3039US5232602APhosphorous removal from tetrachlorosilaneHEMLOCK SEMICONDUCTOR CORP·Filed 1992·Granted Aug 3, 1993·12 cites·11 claims
- 3137US6251182B1Susceptor for float-zone apparatusHEMLOCK SEMICONDUCTOR CORP·Filed 1993·Granted Jun 26, 2001·6 cites·7 claims
- 3236US10851459B2Dichlorosilane compensating control strategy for improved polycrystalline silicon growthHEMLOCK SEMICONDUCTOR CORP·Filed 2016·Granted Dec 1, 2020·0 cites·12 claims
- 3336US2017269004A1Low impurity detection method for characterizing metals within a surface and sub-surface of polycrystalline siliconHEMLOCK SEMICONDUCTOR CORP·Filed 2016·Application pending·0 cites
- 3433US10005614B2Surface conditioning of conveyor materials or contact surfacesHEMLOCK SEMICONDUCTOR CORP·Filed 2016·Granted Jun 26, 2018·0 cites·14 claims
- 3522US5529935AMethod for determining organoamines concentrations in chlorosilaneHEMLOCK SEMICONDUCTOR CORP·Filed 1995·Granted Jun 25, 1996·3 cites·11 claims
- 3621US10431447B2Polysilicon chip reclamation assembly and method of reclaiming polysilicon chips from a polysilicon cleaning apparatusHEMLOCK SEMICONDUCTOR CORP·Filed 2015·Granted Oct 1, 2019·0 cites·14 claims
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