Assignee

HEO DONGHO

US·2 granted patents·28 citations·filing 2007–2008

Technology mixH10P2 H10W2

Top patents by PatentIndex Score

2 records

0189US8277670B2Plasma process with photoresist mask pretreatmentHEO DONGHO·Filed 2008·Granted Oct 2, 2012·19 cites·19 claims
0283US8172948B2De-fluoridation processHEO DONGHO·Filed 2007·Granted May 8, 2012·9 cites·20 claims

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