Assignee
HETZLER JOCHEN
DE·2 granted patents·1 pending application·5 citations·filing 2010–2013
Top patents by PatentIndex Score
3 records- 0178US8089634B2Optical element and method of calibrating a measuring apparatus comprising a wave shaping structureHETZLER JOCHEN·Filed 2010·Granted Jan 3, 2012·4 cites·20 claims
- 0266US9606339B2Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatusHETZLER JOCHEN·Filed 2012·Granted Mar 28, 2017·1 cites·3 claims
- 0341US2013182264A1Projection Exposure Tool for Microlithography and Method for Microlithographic ExposureHETZLER JOCHEN·Filed 2013·Application pending·0 cites
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