Assignee
HIRAYAMA TAKU
JP·1 granted patent·7 pending applications·0 citations·filing 2003–2008
Top patents by PatentIndex Score
8 records- 0147US2007281098A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2007·Application pending·0 cites
- 0243US2006021964A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 0335US2006141400A1Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming methodHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 0434US2009011375A1Immersion liquid for liquid immersion lithography process and method for forming resist pattern using the sameHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 0533US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
- 0632US2006154188A1Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluidHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 0731US2006154171A1Photoresist composition and method of forming resist patternHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 0830US2006003252A1Chemical amplification type silicone based positive photoresist compositionHIRAYAMA TAKU·Filed 2003·Application pending·0 cites
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