Assignee
HOFFMAN DANIEL J
12 granted patents·4 pending applications·459 citations·filing 2002–2012
Top patents by PatentIndex Score
16 records- 0197US9309594B2System, method and apparatus for controlling ion energy distribution of a projected plasmaHOFFMAN DANIEL J·Filed 2011·Granted Apr 12, 2016·79 cites·7 claims
- 0297US8884525B2Remote plasma source generating a disc-shaped plasmaHOFFMAN DANIEL J·Filed 2012·Granted Nov 11, 2014·91 cites·10 claims
- 0397US8723423B2Electrostatic remote plasma sourceHOFFMAN DANIEL J·Filed 2012·Granted May 13, 2014·56 cites·12 claims
- 0496US8070925B2Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter targetHOFFMAN DANIEL J·Filed 2008·Granted Dec 6, 2011·36 cites·18 claims
- 0595US9210790B2Systems and methods for calibrating a switched mode ion energy distribution systemHOFFMAN DANIEL J·Filed 2012·Granted Dec 8, 2015·104 cites·28 claims
- 0694US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 0792US6838635B2Plasma reactor with overhead RF electrode tuned to the plasmaHOFFMAN DANIEL J·Filed 2002·Granted Jan 4, 2005·36 cites·16 claims
- 0891US9593411B2Physical vapor deposition chamber with capacitive tuning at wafer supportHOFFMAN DANIEL J·Filed 2012·Granted Mar 14, 2017·8 cites·15 claims
- 0989US8647438B2Annular baffleHOFFMAN DANIEL J·Filed 2008·Granted Feb 11, 2014·11 cites·10 claims
- 1083US8607731B2Cathode with inner and outer electrodes at different heightsHOFFMAN DANIEL J·Filed 2008·Granted Dec 17, 2013·8 cites·16 claims
- 1179US9856558B2Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surfaceHOFFMAN DANIEL J·Filed 2008·Granted Jan 2, 2018·3 cites·18 claims
- 1275US10225919B2Projected plasma sourceHOFFMAN DANIEL J·Filed 2011·Granted Mar 5, 2019·1 cites·21 claims
- 1360US2007251920A1Method of operating a plasma reactor having an overhead electrode with a fixed impedance match elementHOFFMAN DANIEL J·Filed 2007·Application pending·0 cites
- 1460US2008023143A1Capacitively coupled plasma reactor with magnetic plasma controlHOFFMAN DANIEL J·Filed 2007·Application pending·0 cites
- 1552US2009250335A1Method of controlling plasma distribution uniformity by superposition of different constant solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
- 1652US2009250432A1Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
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