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INOUE HISASHI

JP4 patents

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US8230806B2Jul 31, 2012

Heat treatment method and heat treatment apparatus wherein the substrate holder is composed of two holder constituting bodies that move relative to each other

INOUE HISASHI6 citations83
US8741064B2Jun 3, 2014

Heat treatment method and heat treatment apparatus

INOUE HISASHI1 citations61
US8224151B2Jul 17, 2012

Apparatus for recording and reproducing digital image and speech

INOUE HISASHI0 citations50
US8153534B2Apr 10, 2012

Direct oxidation method for semiconductor process

INOUE HISASHI1 citations47