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INPRIA CORP
US63 patents
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US10775696B2Sep 15, 2020
Organotin oxide hydroxide patterning compositions, precursors, and patterning
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Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US10416554B2Sep 17, 2019
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US10228618B2Mar 12, 2019
Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US10025179B2Jul 17, 2018
Organometallic solution based high resolution patterning compositions
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US9310684B2Apr 12, 2016
Organometallic solution based high resolution patterning compositions
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US10782610B2Sep 22, 2020
Radiation based patterning methods
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US10642153B2May 5, 2020
Organometallic solution based high resolution patterning compositions and corresponding methods
INPRIA CORP65 citations97
US10627719B2Apr 21, 2020
Methods of reducing metal residue in edge bead region from metal-containing resists
INPRIA CORP44 citations97
US9823564B2Nov 21, 2017
Patterned inorganic layers, radiation based patterning compositions and corresponding methods
INPRIA CORP27 citations97
US10787466B2Sep 29, 2020
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
INPRIA CORP54 citations96
US10975109B2Apr 13, 2021
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
INPRIA CORP18 citations93
US10649328B2May 12, 2020
Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates
INPRIA CORP31 citations93
US11988960B2May 21, 2024
Organometallic solution based high resolution patterning compositions
INPRIA CORP4 citations86
US11988958B2May 21, 2024
Organometallic solution based high resolution patterning compositions
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US11966159B2Apr 23, 2024
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INPRIA CORP4 citations86
US11809081B2Nov 7, 2023
Organotin oxide hydroxide patterning compositions, precursors, and patterning
INPRIA CORP4 citations86
US8366967B2Feb 5, 2013
Metal chalcogenide aqueous precursors and processes to form metal chalcogenide films
INPRIA CORP24 citations86
US11500284B2Nov 15, 2022
Organometallic solution based high resolution patterning compositions and corresponding methods
INPRIA CORP9 citations85
US11392028B2Jul 19, 2022
Tin dodecamers and radiation patternable coatings with strong EUV absorption
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US11098070B2Aug 24, 2021
Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
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Radiation based patterning methods
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US12276913B2Apr 15, 2025
Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US12189286B2Jan 7, 2025
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US11897906B2Feb 13, 2024
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
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US11187986B2Nov 30, 2021
Apparatuses for reducing metal residue in edge bead region from metal-containing resists
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US11673903B2Jun 13, 2023
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
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US11868046B2Jan 9, 2024
Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
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US11300876B2Apr 12, 2022
Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
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US11498934B2Nov 15, 2022
Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods
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US12578646B2Mar 17, 2026
Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US12554195B2Feb 17, 2026
Radiation based patterning methods
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US12522621B2Jan 13, 2026
Tin dodecamers and radiation patternable coatings with strong euv absorption
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US12487522B2Dec 2, 2025
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US12443105B2Oct 14, 2025
Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US12129271B2Oct 29, 2024
Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
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US12071449B2Aug 27, 2024
Tin dodecamers and radiation patternable coatings with strong EUV absorption
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US11988961B2May 21, 2024
Radiation based patterning methods
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US11754924B2Sep 12, 2023
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US11693312B2Jul 4, 2023
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US11537048B2Dec 27, 2022
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US11392029B2Jul 19, 2022
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US11392031B2Jul 19, 2022
Radiation based patterning methods
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US11347145B2May 31, 2022
Pre-patterned lithography templates
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US12338260B2Jun 24, 2025
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
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US12180240B2Dec 31, 2024
Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
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US11740559B2Aug 29, 2023
Apparatuses for reducing metal residue in edge bead region from metal-containing resists
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US12399426B2Aug 26, 2025
Patterned organometallic photoresists and methods of patterning
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US12105418B2Oct 1, 2024
Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
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Showing the top 50 of 63 patents by PatentIndex Score.