Assignee
ISHIDUKA KEITA
JP·2 granted patents·4 pending applications·0 citations·filing 2005–2010
Top patents by PatentIndex Score
6 records- 0142US8278025B2Material for forming resist protection films and method for resist pattern formation with the sameISHIDUKA KEITA·Filed 2005·Granted Oct 2, 2012·0 cites·6 claims
- 0240US8409781B2Composition for formation of resist protection film, and method for formation of resist pattern using the sameISHIDUKA KEITA·Filed 2007·Granted Apr 2, 2013·0 cites·3 claims
- 0337US2009053646A1Material for protective film formation and method of forming resist pattern therewithISHIDUKA KEITA·Filed 2006·Application pending·0 cites
- 0436US2007190448A1Positive-type resist composition for liquid immersion lithography and method for forming resist patternISHIDUKA KEITA·Filed 2005·Application pending·0 cites
- 0532US2011053097A1Protective film-forming material and method of photoresist patterning with itISHIDUKA KEITA·Filed 2010·Application pending·0 cites
- 0630US2010151395A1Protective film-removing solvent and method of photoresist patterning with itISHIDUKA KEITA·Filed 2010·Application pending·0 cites
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