Assignee
JET PROCESS CORP
US·11 granted patents·1,229 citations·filing 1990–2001
Top patents by PatentIndex Score
11 records- 0197US5356672AMethod for microwave plasma assisted supersonic gas jet deposition of thin filmsJET PROCESS CORP·Filed 1990·Granted Oct 18, 1994·546 cites·7 claims
- 0295US5356673AEvaporation system and method for gas jet deposition of thin film materialsJET PROCESS CORP·Filed 1991·Granted Oct 18, 1994·183 cites·39 claims
- 0394US5256205AMicrowave plasma assisted supersonic gas jet deposition of thin film materialsJET PROCESS CORP·Filed 1992·Granted Oct 26, 1993·145 cites·36 claims
- 0488US5725672AApparatus for the high speed, low pressure gas jet deposition of conducting and dielectric thin sold filmsJET PROCESS CORP·Filed 1995·Granted Mar 10, 1998·75 cites·28 claims
- 0585US5571332AElectron jet vapor deposition systemJET PROCESS CORP·Filed 1995·Granted Nov 5, 1996·73 cites·10 claims
- 0679US6165554AMethod for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin filmsJET PROCESS CORP·Filed 1998·Granted Dec 26, 2000·47 cites·14 claims
- 0779US5650197AJet vapor deposition of organic molecule guest-inorganic host thin filmsJET PROCESS CORP·Filed 1995·Granted Jul 22, 1997·46 cites·8 claims
- 0872US5720821AJet vapor deposition of organic molecule guest-inorganic host thin filmsJET PROCESS CORP·Filed 1995·Granted Feb 24, 1998·35 cites·8 claims
- 0968US5759634AJet vapor deposition of nanocluster embedded thin filmsJET PROCESS CORP·Filed 1994·Granted Jun 2, 1998·44 cites·12 claims
- 1067US6509067B2Method and apparatus for the deposition of metal nanoclusters and films on a substrateJET PROCESS CORP·Filed 2001·Granted Jan 21, 2003·7 cites·11 claims
- 1161US6148764AMultiple micro inlet silane injection system for the jet vapor deposition of silicon nitride with a microwave discharge jet sourceJET PROCESS CORP·Filed 1998·Granted Nov 21, 2000·28 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when JET PROCESS CORP files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →