Assignee
KABE YOSHIRO
JP·3 granted patents·3 pending applications·5 citations·filing 2005–2012
Top patents by PatentIndex Score
6 records- 0168US8389420B2Method and apparatus for forming silicon oxide filmKABE YOSHIRO·Filed 2011·Granted Mar 5, 2013·2 cites·11 claims
- 0259US8318267B2Method and apparatus for forming silicon oxide filmKABE YOSHIRO·Filed 2007·Granted Nov 27, 2012·1 cites·14 claims
- 0359US8105958B2Semiconductor device manufacturing method and plasma oxidation treatment methodKABE YOSHIRO·Filed 2005·Granted Jan 31, 2012·2 cites·18 claims
- 0437US2012252209A1Plasma nitriding method, plasma nitriding apparatus and method of manufacturing semiconductor deviceKABE YOSHIRO·Filed 2012·Application pending·0 cites
- 0534US2012248583A1Method for forming germanium oxide film and material for electronic deviceKABE YOSHIRO·Filed 2012·Application pending·0 cites
- 0631US2012252226A1Plasma processing methodKABE YOSHIRO·Filed 2012·Application pending·0 cites
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