Assignee
KATAYAMA MAMI
JP2 patents
Top patents by PatentIndex Score
US8476444B2Jul 2, 2013
Base generator
KATAYAMA MAMI8 citations79
US8697332B2Apr 15, 2014
Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
KATAYAMA MAMI2 citations58