Assignee
KAWAI HIDEMI
US5 patents
Top patents by PatentIndex Score
US8670103B2Mar 11, 2014
Cleanup method for optics in immersion lithography using bubbles
KAWAI HIDEMI4 citations83
US8670104B2Mar 11, 2014
Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
KAWAI HIDEMI4 citations83
US8493545B2Jul 23, 2013
Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port
KAWAI HIDEMI5 citations83
US8269946B2Sep 18, 2012
Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid
KAWAI HIDEMI8 citations83
US8085381B2Dec 27, 2011
Cleanup method for optics in immersion lithography using sonic device
KAWAI HIDEMI4 citations73