Assignee
KIM WEONHONG
KR·2 granted patents·16 citations·filing 2011–2011
Technology mixH10D2
Top patents by PatentIndex Score
2 records- 0185US8652908B2Semiconductor devices employing high-K dielectric layers as a gate insulating layer and methods of fabricating the sameKIM WEONHONG·Filed 2011·Granted Feb 18, 2014·9 cites·11 claims
- 0281US8673711B2Methods of fabricating a semiconductor device having a high-K gate dielectric layer and semiconductor devices fabricated therebyKIM WEONHONG·Filed 2011·Granted Mar 18, 2014·7 cites·18 claims
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