Assignee
KISHIMOTO KATSUSHI
JP·4 granted patents·15 pending applications·22 citations·filing 2006–2012
Top patents by PatentIndex Score
19 records- 0186US8137046B2Substrate transfer apparatus and substrate transfer methodKISHIMOTO KATSUSHI·Filed 2009·Granted Mar 20, 2012·14 cites·9 claims
- 0281US8092640B2Plasma processing apparatus and semiconductor device manufactured by the same apparatusKISHIMOTO KATSUSHI·Filed 2006·Granted Jan 10, 2012·7 cites·20 claims
- 0360US8395250B2Plasma processing apparatus with an exhaust port above the substrateKISHIMOTO KATSUSHI·Filed 2008·Granted Mar 12, 2013·1 cites·7 claims
- 0454US2010034622A1Substrate transfer apparatusKISHIMOTO KATSUSHI·Filed 2009·Application pending·0 cites
- 0552US2013069193A1Intermediate layer for stacked type photoelectric conversion device, stacked type photoelectric conversion device and method for manufacturing stacked type photoelectric conversion deviceKISHIMOTO KATSUSHI·Filed 2011·Application pending·0 cites
- 0652US2009166622A1Plasma processing apparatus and semiconductor element manufactured by such apparatusKISHIMOTO KATSUSHI·Filed 2006·Application pending·0 cites
- 0750US2009113912A1Cooling System, Method for Operating the Same, and Plasma Processing System Using Cooling SystemKISHIMOTO KATSUSHI·Filed 2006·Application pending·0 cites
- 0848US2011108128A1Vacuum treatment apparatus and gas supply methodKISHIMOTO KATSUSHI·Filed 2009·Application pending·0 cites
- 0948US2012219390A1Substrate transfer apparatusKISHIMOTO KATSUSHI·Filed 2012·Application pending·0 cites
- 1047US2011312167A1Plasma processing apparatus, and deposition method an etching method using the plasma processing apparatusKISHIMOTO KATSUSHI·Filed 2009·Application pending·0 cites
- 1146US2010282168A1Plasma processing apparatus, heating device for plasma processing apparatus, and plasma processing methodKISHIMOTO KATSUSHI·Filed 2008·Application pending·0 cites
- 1246US2010012037A1Substrate transfer apparatusKISHIMOTO KATSUSHI·Filed 2009·Application pending·0 cites
- 1346US2010277050A1Plasma processing apparatusKISHIMOTO KATSUSHI·Filed 2008·Application pending·0 cites
- 1444US8389389B2Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus, and semiconductor device manufactured using such method and apparatusKISHIMOTO KATSUSHI·Filed 2007·Granted Mar 5, 2013·0 cites·13 claims
- 1543US2010147379A1Silicon-based thin-film photoelectric conversion device, and method and apparatus for manufacturing the sameKISHIMOTO KATSUSHI·Filed 2006·Application pending·0 cites
- 1643US2009166328A1Plasma etching methodKISHIMOTO KATSUSHI·Filed 2006·Application pending·0 cites
- 1741US2008164144A1Plasma Processing Apparatus And Method Of Producing Semiconductor Thin Film Using The SameKISHIMOTO KATSUSHI·Filed 2006·Application pending·0 cites
- 1837US2012251723A1Method of cleaning film forming apparatus, film forming method, and film forming apparatusKISHIMOTO KATSUSHI·Filed 2010·Application pending·0 cites
- 1936US2012155994A1Vacuum processing device and vacuum processing factoryKISHIMOTO KATSUSHI·Filed 2010·Application pending·0 cites
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