Assignee
KLA TENCOR TECH CORP
US·580 granted patents·15 pending applications·18,060 citations·filing 1995–2015
Top patents by PatentIndex Score
595 records- 0198US8010222B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2008·Granted Aug 30, 2011·29 cites·10 claims
- 0298US7873504B1Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layoutKLA TENCOR TECH CORP·Filed 2007·Granted Jan 18, 2011·60 cites·19 claims
- 0398US7656170B2Multiple directional scans of test structures on semiconductor integrated circuitsKLA TENCOR TECH CORP·Filed 2007·Granted Feb 2, 2010·96 cites·12 claims
- 0498US7646906B2Computer-implemented methods for detecting defects in reticle design dataKLA TENCOR TECH CORP·Filed 2005·Granted Jan 12, 2010·85 cites·22 claims
- 0598US7570796B2Methods and systems for utilizing design data in combination with inspection dataKLA TENCOR TECH CORP·Filed 2006·Granted Aug 4, 2009·286 cites·88 claims
- 0698US7528943B2Method and apparatus for simultaneous high-speed acquisition of multiple imagesKLA TENCOR TECH CORP·Filed 2005·Granted May 5, 2009·76 cites·28 claims
- 0798US7525649B1Surface inspection system using laser line illumination with two dimensional imagingKLA TENCOR TECH CORP·Filed 2007·Granted Apr 28, 2009·164 cites·19 claims
- 0898US7514681B1Electrical process monitoring using mirror-mode electron microscopyKLA TENCOR TECH CORP·Filed 2006·Granted Apr 7, 2009·94 cites·32 claims
- 0998US7440105B2Continuously varying offset mark and methods of determining overlayKLA TENCOR TECH CORP·Filed 2005·Granted Oct 21, 2008·93 cites·12 claims
- 1098US7433056B1Scatterometry metrology using inelastic scatteringKLA TENCOR TECH CORP·Filed 2005·Granted Oct 7, 2008·55 cites·20 claims
- 1198US7315022B1High-speed electron beam inspectionKLA TENCOR TECH CORP·Filed 2005·Granted Jan 1, 2008·59 cites·16 claims
- 1298US6897444B1Multi-pixel electron emission die-to-die inspectionKLA TENCOR TECH CORP·Filed 2003·Granted May 24, 2005·95 cites·25 claims
- 1398US6891627B1Methods and systems for determining a critical dimension and overlay of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted May 10, 2005·192 cites·100 claims
- 1498US6694284B1Methods and systems for determining at least four properties of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Feb 17, 2004·211 cites·61 claims
- 1598US6486954B1Overlay alignment measurement markKLA TENCOR TECH CORP·Filed 2000·Granted Nov 26, 2002·199 cites·38 claims
- 1697US9401014B2Methods and systems for utilizing design data in combination with inspection dataKLA-TENCOR TECH CORP·Filed 2014·Granted Jul 26, 2016·22 cites·103 claims
- 1797US7952633B2Apparatus for continuous clocking of TDI sensorsKLA TENCOR TECH CORP·Filed 2005·Granted May 31, 2011·63 cites·26 claims
- 1897US7893703B2Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the waferKLA TENCOR TECH CORP·Filed 2006·Granted Feb 22, 2011·104 cites·18 claims
- 1997US7873585B2Apparatus and methods for predicting a semiconductor parameter across an area of a waferKLA TENCOR TECH CORP·Filed 2007·Granted Jan 18, 2011·96 cites·26 claims
- 2097US7769225B2Methods and systems for detecting defects in a reticle design patternKLA TENCOR TECH CORP·Filed 2005·Granted Aug 3, 2010·80 cites·19 claims
- 2197US7676077B2Methods and systems for utilizing design data in combination with inspection dataKLA TENCOR TECH CORP·Filed 2006·Granted Mar 9, 2010·277 cites·58 claims
- 2297US7652430B1Broadband plasma light sources with cone-shaped electrode for substrate processingKLA TENCOR TECH CORP·Filed 2005·Granted Jan 26, 2010·40 cites·32 claims
- 2397US7627007B1Non-critical phase matching in CLBO to generate sub-213nm wavelengthsKLA TENCOR TECH CORP·Filed 2006·Granted Dec 1, 2009·42 cites·17 claims
- 2497US7607647B2Stabilizing a substrate using a vacuum preload air bearing chuckKLA TENCOR TECH CORP·Filed 2007·Granted Oct 27, 2009·96 cites·41 claims
- 2597US7561282B1Techniques for determining overlay and critical dimension using a single metrology toolKLA TENCOR TECH CORP·Filed 2006·Granted Jul 14, 2009·48 cites·20 claims
- 2697US7541201B2Apparatus and methods for determining overlay of structures having rotational or mirror symmetryKLA TENCOR TECH CORP·Filed 2005·Granted Jun 2, 2009·41 cites·22 claims
- 2797US7433040B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Oct 7, 2008·28 cites·18 claims
- 2897US7345825B2Beam delivery system for laser dark-field illumination in a catadioptric optical systemKLA TENCOR TECH CORP·Filed 2005·Granted Mar 18, 2008·60 cites·23 claims
- 2997US7317824B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2006·Granted Jan 8, 2008·22 cites·60 claims
- 3097US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 3197US7280945B1Apparatus and methods for detection of systematic defectsKLA TENCOR TECH CORP·Filed 2002·Granted Oct 9, 2007·121 cites·35 claims
- 3297US7276694B1Defect detection using energy spectrometerKLA TENCOR TECH CORP·Filed 2005·Granted Oct 2, 2007·45 cites·19 claims
- 3397US7242477B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jul 10, 2007·124 cites·20 claims
- 3497US6985618B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2002·Granted Jan 10, 2006·98 cites·41 claims
- 3597US6842298B1Broad band DUV, VUV long-working distance catadioptric imaging systemKLA TENCOR TECH CORP·Filed 2001·Granted Jan 11, 2005·83 cites·38 claims
- 3697US6751519B1Methods and systems for predicting IC chip yieldKLA TENCOR TECH CORP·Filed 2002·Granted Jun 15, 2004·222 cites·33 claims
- 3797US6483580B1Spectroscopic scatterometer systemKLA TENCOR TECH CORP·Filed 1998·Granted Nov 19, 2002·263 cites·155 claims
- 3897US6288780B1High throughput brightfield/darkfield wafer inspection system using advanced optical techniquesKLA TENCOR TECH CORP·Filed 1997·Granted Sep 11, 2001·207 cites·26 claims
- 3996US8041103B2Methods and systems for determining a position of inspection data in design data spaceKLA TENCOR TECH CORP·Filed 2007·Granted Oct 18, 2011·85 cites·18 claims
- 4096US8033190B2Process condition sensing wafer and data analysis systemKLA TENCOR TECH CORP·Filed 2010·Granted Oct 11, 2011·22 cites·15 claims
- 4196US7751046B2Methods and systems for determining a critical dimension and overlay of a specimenKLA TENCOR TECH CORP·Filed 2003·Granted Jul 6, 2010·79 cites·13 claims
- 4296US7691549B1Multiple exposure lithography technique and methodKLA TENCOR TECH CORP·Filed 2007·Granted Apr 6, 2010·31 cites·20 claims
- 4396US7689966B2Methods, systems, and carrier media for evaluating reticle layout dataKLA TENCOR TECH CORP·Filed 2005·Granted Mar 30, 2010·57 cites·31 claims
- 4496US7571422B2Method for generating a design rule map having spatially varying overlay budgetKLA TENCOR TECH CORP·Filed 2007·Granted Aug 4, 2009·36 cites·16 claims
- 4596US7566517B1Feature printability optimization by optical toolKLA TENCOR TECH CORP·Filed 2005·Granted Jul 28, 2009·28 cites·19 claims
- 4696US7564557B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Jul 21, 2009·19 cites·7 claims
- 4796US7557921B1Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic toolsKLA TENCOR TECH CORP·Filed 2005·Granted Jul 7, 2009·55 cites·14 claims
- 4896US7492451B2Simultaneous multi-spot inspection and imagingKLA TENCOR TECH CORP·Filed 2006·Granted Feb 17, 2009·31 cites·37 claims
- 4996US7417722B2System and method for controlling light scattered from a workpiece surface in a surface inspection systemKLA TENCOR TECH CORP·Filed 2005·Granted Aug 26, 2008·26 cites·20 claims
- 5096US7304310B1Methods and systems for inspecting a specimen using light scattered in different wavelength rangesKLA TENCOR TECH CORP·Filed 2003·Granted Dec 4, 2007·89 cites·25 claims
Showing the top 50 of 595 patent records by PatentIndex Score.
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