Assignee
KOSHIISHI AKIRA
JP·9 granted patents·4 pending applications·131 citations·filing 2005–2012
Top patents by PatentIndex Score
13 records- 0197US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0293US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 0388US8852385B2Plasma etching apparatus and methodKOSHIISHI AKIRA·Filed 2007·Granted Oct 7, 2014·12 cites·17 claims
- 0488US8741098B2Table for use in plasma processing system and plasma processing systemKOSHIISHI AKIRA·Filed 2007·Granted Jun 3, 2014·11 cites·13 claims
- 0588US8084375B2Hot edge ring with sloped upper surfaceKOSHIISHI AKIRA·Filed 2010·Granted Dec 27, 2011·13 cites·15 claims
- 0680US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 0779US8080126B2Plasma processing apparatusKOSHIISHI AKIRA·Filed 2008·Granted Dec 20, 2011·4 cites·4 claims
- 0877US8512510B2Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2011·Granted Aug 20, 2013·3 cites·17 claims
- 0957US2010043974A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2009·Application pending·0 cites
- 1053US8980046B2Semiconductor processing system with source for decoupled ion and radical controlKOSHIISHI AKIRA·Filed 2012·Granted Mar 17, 2015·0 cites·21 claims
- 1150US2008073032A1Stage for plasma processing apparatus, and plasma processing apparatusKOSHIISHI AKIRA·Filed 2007·Application pending·0 cites
- 1249US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
- 1349US2006000803A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2005·Application pending·0 cites
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