Assignee
KURT J LESKER COMPANY
US·5 granted patents·4 pending applications·72 citations·filing 2000–2023
Top patents by PatentIndex Score
9 records- 0192US6830626B1Method and apparatus for coating a substrate in a vacuumKURT J LESKER COMPANY·Filed 2000·Granted Dec 14, 2004·72 cites·36 claims
- 0258US2023230802A1Ultra High Purity Conditions for Atomic Scale ProcessingKURT J LESKER COMPANY·Filed 2023·Application pending·0 cites
- 0354US11631571B2Ultra high purity conditions for atomic scale processingKURT J LESKER COMPANY·Filed 2020·Granted Apr 18, 2023·0 cites·20 claims
- 0445US2005147753A1Material deposition system and a method for coating a substrate or thermally processing a material in a vacuumKURT J LESKER COMPANY·Filed 2004·Application pending·0 cites
- 0544US2021140035A1Compound Motion Vacuum Environment Deposition Source Shutter MechanismKURT J LESKER COMPANY·Filed 2020·Application pending·0 cites
- 0641US12205803B2Pressure-induced temperature modification during atomic scale processingKURT J LESKER COMPANY·Filed 2022·Granted Jan 21, 2025·0 cites·9 claims
- 0732US10358713B2Surrounding field sputtering sourceKURT J LESKER COMPANY·Filed 2015·Granted Jul 23, 2019·0 cites·20 claims
- 0829US10115574B2Hermetically sealed magnetic keeper cathodeKURT J LESKER COMPANY·Filed 2016·Granted Oct 30, 2018·0 cites·12 claims
- 0925US2016099135A1Rectangular Hollow Sputter Source and Method of use ThereofKURT J LESKER COMPANY·Filed 2015·Application pending·0 cites
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