Assignee
KUSHIBIKI MASATO
JP·8 granted patents·217 citations·filing 2008–2012
Top patents by PatentIndex Score
8 records- 0198US8491805B2Semiconductor device manufacturing method and plasma etching apparatusKUSHIBIKI MASATO·Filed 2011·Granted Jul 23, 2013·211 cites·8 claims
- 0271US8241511B2Substrate processing methodKUSHIBIKI MASATO·Filed 2008·Granted Aug 14, 2012·3 cites·7 claims
- 0370US8642136B2Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition processKUSHIBIKI MASATO·Filed 2009·Granted Feb 4, 2014·3 cites·5 claims
- 0451US8530354B2Substrate processing methodKUSHIBIKI MASATO·Filed 2012·Granted Sep 10, 2013·0 cites·3 claims
- 0550US8252698B2Substrate processing methodKUSHIBIKI MASATO·Filed 2009·Granted Aug 28, 2012·0 cites·20 claims
- 0646US8815495B2Pattern forming method and manufacturing method of semiconductor deviceKUSHIBIKI MASATO·Filed 2010·Granted Aug 26, 2014·0 cites·15 claims
- 0741US8202805B2Substrate processing methodKUSHIBIKI MASATO·Filed 2010·Granted Jun 19, 2012·0 cites·18 claims
- 0839US8491804B2Substrate processing methodKUSHIBIKI MASATO·Filed 2010·Granted Jul 23, 2013·0 cites·20 claims
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