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KWESKIN SASHA
US
2 patents
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US8236708B2
Aug 7, 2012
Reduced pattern loading using bis(diethylamino)silane (C8H22N2Si) as silicon precursor
KWESKIN SASHA
27 citations
89
US8476142B2
Jul 2, 2013
Preferential dielectric gapfill
KWESKIN SASHA
4 citations
56