Assignee
LAI SHOULIANG
2 granted patents·7 citations·filing 2005–2007
Top patents by PatentIndex Score
2 records- 0170US7959819B2Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processesLAI SHOULIANG·Filed 2005·Granted Jun 14, 2011·4 cites·4 claims
- 0264US7829465B2Method for plasma etching of positively sloped structuresLAI SHOULIANG·Filed 2007·Granted Nov 9, 2010·3 cites·26 claims
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