Assignee
LAM RES CORP
US3,256 patents
Top patents by PatentIndex Score
US9996004B2Jun 12, 2018
EUV photopatterning of vapor-deposited metal oxide-containing hardmasks
LAM RES CORP398 citations99
US9997373B2Jun 12, 2018
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
LAM RES CORP434 citations99
US9997357B2Jun 12, 2018
Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
LAM RES CORP430 citations99
US9966299B2May 8, 2018
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
LAM RES CORP365 citations99
US9911595B1Mar 6, 2018
Selective growth of silicon nitride
LAM RES CORP388 citations99
US9875891B2Jan 23, 2018
Selective inhibition in atomic layer deposition of silicon-containing films
LAM RES CORP478 citations99
US9865815B2Jan 9, 2018
Bromine containing silicon precursors for encapsulation layers
LAM RES CORP434 citations99
US9852889B1Dec 26, 2017
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
LAM RES CORP135 citations99
US9778561B2Oct 3, 2017
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP380 citations99
US9745658B2Aug 29, 2017
Chamber undercoat preparation method for low temperature ALD films
LAM RES CORP375 citations99
US9685320B2Jun 20, 2017
Methods for depositing silicon oxide
LAM RES CORP495 citations99
US9583357B1Feb 28, 2017
Systems and methods for reverse pulsing
LAM RES CORP98 citations99
US9564312B2Feb 7, 2017
Selective inhibition in atomic layer deposition of silicon-containing films
LAM RES CORP415 citations99
US9425078B2Aug 23, 2016
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
LAM RES CORP454 citations99
US9257274B2Feb 9, 2016
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
LAM RES CORP523 citations99
US7858898B2Dec 28, 2010
Bevel etcher with gap control
LAM RES CORP349 citations99
US7651269B2Jan 26, 2010
Temperature probes having a thermally isolated tip
LAM RES CORP498 citations99
US7611640B1Nov 3, 2009
Minimizing arcing in a plasma processing chamber
LAM RES CORP365 citations99
US7274004B2Sep 25, 2007
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
LAM RES CORP170 citations99
US7086347B2Aug 8, 2006
Apparatus and methods for minimizing arcing in a plasma processing chamber
LAM RES CORP380 citations99
US7084070B1Aug 1, 2006
Treatment for corrosion in substrate processing
LAM RES CORP247 citations99
US6988327B2Jan 24, 2006
Methods and systems for processing a substrate using a dynamic liquid meniscus
LAM RES CORP164 citations99
US6949204B1Sep 27, 2005
Deformation reduction at the main chamber
LAM RES CORP415 citations99
US6847014B1Jan 25, 2005
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
LAM RES CORP704 citations99
US6770166B1Aug 3, 2004
Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor
LAM RES CORP185 citations99
US6527911B1Mar 4, 2003
Configurable plasma volume etch chamber
LAM RES CORP218 citations99
US6483690B1Nov 19, 2002
Ceramic electrostatic chuck assembly and method of making
LAM RES CORP155 citations99
US6432831B2Aug 13, 2002
Gas distribution apparatus for semiconductor processing
LAM RES CORP315 citations99
US6415736B1Jul 9, 2002
Gas distribution apparatus for semiconductor processing
LAM RES CORP365 citations99
US6394026B1May 28, 2002
Low contamination high density plasma etch chambers and methods for making the same
LAM RES CORP107 citations99
US6391787B1May 21, 2002
Stepped upper electrode for plasma processing uniformity
LAM RES CORP153 citations99
US6320320B1Nov 20, 2001
Method and apparatus for producing uniform process rates
LAM RES CORP411 citations99
US6305677B1Oct 23, 2001
Perimeter wafer lifting
LAM RES CORP122 citations99
US6245192B1Jun 12, 2001
Gas distribution apparatus for semiconductor processing
LAM RES CORP407 citations99
US6129808AOct 10, 2000
Low contamination high density plasma etch chambers and methods for making the same
LAM RES CORP215 citations99
US6125025ASep 26, 2000
Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors
LAM RES CORP158 citations99
US5863376AJan 26, 1999
Temperature controlling method and apparatus for a plasma processing chamber
LAM RES CORP281 citations99
US5368710ANov 29, 1994
Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
LAM RES CORP135 citations99
US5356478AOct 18, 1994
Plasma cleaning method for removing residues in a plasma treatment chamber
LAM RES CORP892 citations99
US5226967AJul 13, 1993
Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber
LAM RES CORP427 citations99
US10831096B2Nov 10, 2020
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP34 citations98
US10347547B2Jul 9, 2019
Suppressing interfacial reactions by varying the wafer temperature throughout deposition
LAM RES CORP401 citations98
US10177024B2Jan 8, 2019
High temperature substrate pedestal module and components thereof
LAM RES CORP371 citations98
US10121689B2Nov 6, 2018
Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing
LAM RES CORP43 citations98
US10115568B2Oct 30, 2018
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
LAM RES CORP57 citations98
US10109517B1Oct 23, 2018
Rotational indexer with additional rotational axes
LAM RES CORP58 citations98
US9892917B2Feb 13, 2018
Plasma assisted atomic layer deposition of multi-layer films for patterning applications
LAM RES CORP55 citations98
US9842725B2Dec 12, 2017
Using modeling to determine ion energy associated with a plasma system
LAM RES CORP48 citations98
US9824893B1Nov 21, 2017
Tin oxide thin film spacers in semiconductor device manufacturing
LAM RES CORP442 citations98
US9824884B1Nov 21, 2017
Method for depositing metals free ald silicon nitride films using halide-based precursors
LAM RES CORP348 citations98
Showing the top 50 of 3,256 patents by PatentIndex Score.